X-ray lithography patterning of magnetic materials and their characterization

Patrizio Candeloro*, Rakesh Kumar, Matteo Altissimo, Luca Businaro, Enzo Di Fabrizio, Massimo Conti, Gianluca Gubbiotti, Giovanni Carlotti, Annamaria Gerardino, Roberto Zivieri, Onofrio Donzelli

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

5 Scopus citations


Magnetic arrays of rectangular dots 1100 run × 300 nm with 200 nm spacing (pattern a) and dots 800 nm × 550 nm with 200 nm spacing (pattern b) with the nominal thickness of 30nm in Permalloy (Ni81Fe 19) material were fabricated using X-ray lithography in combination of lift-off technique. A detailed magnetic characterization of the dot arrays was accomplished by magneto-optical Kerr effect investigations and micro-magnetic simulations, with emphasis given to the dependence of the hysteresis loop of the dots on their aspect ratio (shape anisotropy). In addition, the high frequency dynamical properties were probed by Brillouin light scattering (BLS) showing a marked discretization of the Damon-Eshbach surface spin-wave mode induced by the finite lateral dimensions. The measured frequencies compare fairly well to those calculated by an analytical method which considers spin waves confined in rectangular prisms.

Original languageEnglish (US)
Pages (from-to)3802-3806
Number of pages5
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Issue number6 B
StatePublished - Jun 2003
Externally publishedYes


  • BLS measurement
  • Magneto-optical Kerr effects
  • Micro-magnetic simulation
  • Permalloy material
  • X-ray lithography

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)


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