X-ray lithography patterning of magnetic materials and their characterization

Patrizio Candeloro; Rakesh Kumar; Matteo Altissimo; Luca Businaro; Enzo Di Fabrizio; Massimo Conti; Gianluca Gubbiotti; Giovanni Carlotti; Annamaria Gerardino; Roberto Zivieri; Onofrio Donzelli

doi:10.1143/jjap.42.3802

X-ray lithography patterning of magnetic materials and their characterization

Patrizio Candeloro^*, Rakesh Kumar, Matteo Altissimo, Luca Businaro, Enzo Di Fabrizio, Massimo Conti, Gianluca Gubbiotti, Giovanni Carlotti, Annamaria Gerardino, Roberto Zivieri, Onofrio Donzelli

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

5 Scopus citations

Abstract

Magnetic arrays of rectangular dots 1100 run × 300 nm with 200 nm spacing (pattern a) and dots 800 nm × 550 nm with 200 nm spacing (pattern b) with the nominal thickness of 30nm in Permalloy (Ni₈₁Fe ₁₉) material were fabricated using X-ray lithography in combination of lift-off technique. A detailed magnetic characterization of the dot arrays was accomplished by magneto-optical Kerr effect investigations and micro-magnetic simulations, with emphasis given to the dependence of the hysteresis loop of the dots on their aspect ratio (shape anisotropy). In addition, the high frequency dynamical properties were probed by Brillouin light scattering (BLS) showing a marked discretization of the Damon-Eshbach surface spin-wave mode induced by the finite lateral dimensions. The measured frequencies compare fairly well to those calculated by an analytical method which considers spin waves confined in rectangular prisms.

Original language	English (US)
Pages (from-to)	3802-3806
Number of pages	5
Journal	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume	42
Issue number	6 B
DOIs	https://doi.org/10.1143/jjap.42.3802
State	Published - Jun 2003
Externally published	Yes

Keywords

BLS measurement
Magneto-optical Kerr effects
Micro-magnetic simulation
Permalloy material
X-ray lithography

ASJC Scopus subject areas

General Engineering
General Physics and Astronomy

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10.1143/jjap.42.3802

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Candeloro, P., Kumar, R., Altissimo, M., Businaro, L., Di Fabrizio, E., Conti, M., Gubbiotti, G., Carlotti, G., Gerardino, A., Zivieri, R., & Donzelli, O. (2003). X-ray lithography patterning of magnetic materials and their characterization. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 42(6 B), 3802-3806. https://doi.org/10.1143/jjap.42.3802

@article{a47334d094d047bba1160e4a0385a457,

title = "X-ray lithography patterning of magnetic materials and their characterization",

abstract = "Magnetic arrays of rectangular dots 1100 run × 300 nm with 200 nm spacing (pattern a) and dots 800 nm × 550 nm with 200 nm spacing (pattern b) with the nominal thickness of 30nm in Permalloy (Ni81Fe 19) material were fabricated using X-ray lithography in combination of lift-off technique. A detailed magnetic characterization of the dot arrays was accomplished by magneto-optical Kerr effect investigations and micro-magnetic simulations, with emphasis given to the dependence of the hysteresis loop of the dots on their aspect ratio (shape anisotropy). In addition, the high frequency dynamical properties were probed by Brillouin light scattering (BLS) showing a marked discretization of the Damon-Eshbach surface spin-wave mode induced by the finite lateral dimensions. The measured frequencies compare fairly well to those calculated by an analytical method which considers spin waves confined in rectangular prisms.",

keywords = "BLS measurement, Magneto-optical Kerr effects, Micro-magnetic simulation, Permalloy material, X-ray lithography",

author = "Patrizio Candeloro and Rakesh Kumar and Matteo Altissimo and Luca Businaro and {Di Fabrizio}, Enzo and Massimo Conti and Gianluca Gubbiotti and Giovanni Carlotti and Annamaria Gerardino and Roberto Zivieri and Onofrio Donzelli",

year = "2003",

month = jun,

doi = "10.1143/jjap.42.3802",

language = "English (US)",

volume = "42",

pages = "3802--3806",

journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

number = "6 B",

}

Candeloro, P, Kumar, R, Altissimo, M, Businaro, L, Di Fabrizio, E, Conti, M, Gubbiotti, G, Carlotti, G, Gerardino, A, Zivieri, R & Donzelli, O 2003, 'X-ray lithography patterning of magnetic materials and their characterization', Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, vol. 42, no. 6 B, pp. 3802-3806. https://doi.org/10.1143/jjap.42.3802

TY - JOUR

T1 - X-ray lithography patterning of magnetic materials and their characterization

AU - Candeloro, Patrizio

AU - Kumar, Rakesh

AU - Altissimo, Matteo

AU - Businaro, Luca

AU - Di Fabrizio, Enzo

AU - Conti, Massimo

AU - Gubbiotti, Gianluca

AU - Carlotti, Giovanni

AU - Gerardino, Annamaria

AU - Zivieri, Roberto

AU - Donzelli, Onofrio

PY - 2003/6

Y1 - 2003/6

N2 - Magnetic arrays of rectangular dots 1100 run × 300 nm with 200 nm spacing (pattern a) and dots 800 nm × 550 nm with 200 nm spacing (pattern b) with the nominal thickness of 30nm in Permalloy (Ni81Fe 19) material were fabricated using X-ray lithography in combination of lift-off technique. A detailed magnetic characterization of the dot arrays was accomplished by magneto-optical Kerr effect investigations and micro-magnetic simulations, with emphasis given to the dependence of the hysteresis loop of the dots on their aspect ratio (shape anisotropy). In addition, the high frequency dynamical properties were probed by Brillouin light scattering (BLS) showing a marked discretization of the Damon-Eshbach surface spin-wave mode induced by the finite lateral dimensions. The measured frequencies compare fairly well to those calculated by an analytical method which considers spin waves confined in rectangular prisms.

AB - Magnetic arrays of rectangular dots 1100 run × 300 nm with 200 nm spacing (pattern a) and dots 800 nm × 550 nm with 200 nm spacing (pattern b) with the nominal thickness of 30nm in Permalloy (Ni81Fe 19) material were fabricated using X-ray lithography in combination of lift-off technique. A detailed magnetic characterization of the dot arrays was accomplished by magneto-optical Kerr effect investigations and micro-magnetic simulations, with emphasis given to the dependence of the hysteresis loop of the dots on their aspect ratio (shape anisotropy). In addition, the high frequency dynamical properties were probed by Brillouin light scattering (BLS) showing a marked discretization of the Damon-Eshbach surface spin-wave mode induced by the finite lateral dimensions. The measured frequencies compare fairly well to those calculated by an analytical method which considers spin waves confined in rectangular prisms.

KW - BLS measurement

KW - Magneto-optical Kerr effects

KW - Micro-magnetic simulation

KW - Permalloy material

KW - X-ray lithography

UR - http://www.scopus.com/inward/record.url?scp=12444269102&partnerID=8YFLogxK

U2 - 10.1143/jjap.42.3802

DO - 10.1143/jjap.42.3802

M3 - Article

AN - SCOPUS:12444269102

SN - 0021-4922

VL - 42

SP - 3802

EP - 3806

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

IS - 6 B

ER -

X-ray lithography patterning of magnetic materials and their characterization

Abstract

Keywords

ASJC Scopus subject areas

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