X-ray lithography for 3D microfluidic applications

F. Romanato*, M. Tormen, L. Businaro, L. Vaccari, T. Stomeo, A. Passaseo, E. Di Fabrizio

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

38 Scopus citations


This work addresses the fabrication by X-ray lithography of building block structures for integrated microfluidics. In particular, we demonstrate the realization of a closed microfluidic channel based on a multiple tilted X-ray exposure scheme without the need for registration steps. This scheme is exploited also for the fabrication of metallic 2D vertical gratings that can be used as sieves or electrical detectors in microfluidic channels. Finally, we describe a new process based on the combination of X-ray and e-beam lithography for the realization of flyover channel connecting vertical micro-tank structures.

Original languageEnglish (US)
Pages (from-to)870-875
Number of pages6
JournalMicroelectronic Engineering
StatePublished - Jun 2004
Externally publishedYes
EventMicro and Nano Engineering 2003 - Cambridge, United Kingdom
Duration: Sep 22 2003Sep 25 2003

Bibliographical note

Funding Information:
This work was supported by the Italian ministry MIUR by financial Grant for FIRB Project under Grant No. RBNE01XPYH.


  • Combined lithographies
  • Microchannel
  • Microfluidics
  • Three-dimensional lithography
  • X-ray lithography

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering


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