X-ray and electron-beam lithography of three-dimensional array structures for photonics

F. Romanato; D. Cojoc; E. Di Fabrizio; M. Galli; D. Bajoni

doi:10.1116/1.1629295

X-ray and electron-beam lithography of three-dimensional array structures for photonics

F. Romanato^*, D. Cojoc, E. Di Fabrizio, M. Galli, D. Bajoni

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

15 Scopus citations

Abstract

The fabrication of 3D photonic crystal (PC) lattices with designed linear defects by electron beam lithography and multitilt x-ray exposures was analyzed. Different lithographies were used in order to control the design and the realization of the linear defects inside the three-dimensional structure. Nickel Yablonovite lattices with a lattice parameter of 1.8 μm and a total thickness of 15 μm were fabricated using the method. The optical reflectance measurements shows that the lattices possessed characteristic resonances as required for 3D PCs.

Original language	English (US)
Pages (from-to)	2912-2917
Number of pages	6
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	21
Issue number	6
DOIs	https://doi.org/10.1116/1.1629295
State	Published - 2003
Externally published	Yes

ASJC Scopus subject areas

Condensed Matter Physics
Electrical and Electronic Engineering

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title = "X-ray and electron-beam lithography of three-dimensional array structures for photonics",

abstract = "The fabrication of 3D photonic crystal (PC) lattices with designed linear defects by electron beam lithography and multitilt x-ray exposures was analyzed. Different lithographies were used in order to control the design and the realization of the linear defects inside the three-dimensional structure. Nickel Yablonovite lattices with a lattice parameter of 1.8 μm and a total thickness of 15 μm were fabricated using the method. The optical reflectance measurements shows that the lattices possessed characteristic resonances as required for 3D PCs.",

author = "F. Romanato and D. Cojoc and {Di Fabrizio}, E. and M. Galli and D. Bajoni",

year = "2003",

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AU - Romanato, F.

AU - Cojoc, D.

AU - Di Fabrizio, E.

AU - Galli, M.

AU - Bajoni, D.

PY - 2003

Y1 - 2003

N2 - The fabrication of 3D photonic crystal (PC) lattices with designed linear defects by electron beam lithography and multitilt x-ray exposures was analyzed. Different lithographies were used in order to control the design and the realization of the linear defects inside the three-dimensional structure. Nickel Yablonovite lattices with a lattice parameter of 1.8 μm and a total thickness of 15 μm were fabricated using the method. The optical reflectance measurements shows that the lattices possessed characteristic resonances as required for 3D PCs.

AB - The fabrication of 3D photonic crystal (PC) lattices with designed linear defects by electron beam lithography and multitilt x-ray exposures was analyzed. Different lithographies were used in order to control the design and the realization of the linear defects inside the three-dimensional structure. Nickel Yablonovite lattices with a lattice parameter of 1.8 μm and a total thickness of 15 μm were fabricated using the method. The optical reflectance measurements shows that the lattices possessed characteristic resonances as required for 3D PCs.

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U2 - 10.1116/1.1629295

DO - 10.1116/1.1629295

M3 - Article

AN - SCOPUS:0942300029

SN - 1071-1023

VL - 21

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JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 6

ER -

X-ray and electron-beam lithography of three-dimensional array structures for photonics

Abstract

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