Work function engineering of RuHf alloys as gate electrodes for future generation dual metal CMOS

H. C. Wen*, P. Majhi, H. Alshareef, C. Huffman, K. Choi, P. Lysaght, R. Harris, H. Luan, B. H. Lee, N. Yamada, S. Wickramanayaka

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

3 Scopus citations

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