Material Science
Plasma-Enhanced Chemical Vapor Deposition
100%
Permittivity
100%
Infrared Spectroscopy
100%
Film
100%
Absorption Spectrum
100%
Spectroscopy Technique
50%
Silane
50%
Oxide Compound
50%
Gas Mixture
50%
Chemistry
Deposition Technique
100%
Dielectric Constant
100%
Liquid Film
100%
Vibrational Spectroscopy
100%
Plasma Enhanced Chemical Vapor Deposition
100%
Absorption Spectrum
40%
Spectroscopy Technique
20%
Raman Spectrum
20%
Fourier Transform Infrared Spectroscopy
20%
Silane
20%
Hydrogen
20%
Engineering
Dielectrics
100%
Vapor Deposition
100%
Chemical Vapor Deposition
100%
Raman Spectrum
50%
Ozone (O3)
50%
Structural Stability
50%
Hybridized Carbon
50%
Oxide Matrix
50%
Gas Mixture
50%
Physics
Permittivity
100%
Absorption Spectra
100%
Vapor Deposition
100%
Gas Mixture
33%
Silane
33%
Infrared Spectrum
33%
Raman Spectra
33%
Structural Stability
33%
Keyphrases
SiOC(-H) Films
100%
Sp2 Carbon
33%
He Plasma
33%
Structural Group
33%
Mode Shift
33%