Vacuum-Free, Maskless Patterning of Ni Electrodes by Laser Reductive Sintering of NiO Nanoparticle Ink and Its Application to Transparent Conductors

Daeho Lee, Dongwoo Paeng, Hee K. Park, Costas P. Grigoropoulos

Research output: Contribution to journalArticlepeer-review

116 Scopus citations

Abstract

© 2014 American Chemical Society. We introduce a method for direct patterning of Ni electrodes through selective laser direct writing (LDW) of NiO nanoparticle (NP) ink. High-resolution Ni patterns are generated from NiO NP thin films by a vacuum-free, lithography-free, and solution-processable route. In particular, a continuous wave laser is used for the LDW reductive sintering of the metal oxide under ambient conditions with the aid of reducing agents in the ink solvent. Thin (∼40 nm) Ni electrodes of glossy metallic surfaces with smooth morphology and excellent edge definition can be fabricated. By applying this method, we demonstrate a high transmittance (>87%), electrically conducting panel for a touch screen panel application. The resistivity of the Ni electrode is less than an order of magnitude higher compared to that of the bulk Ni. Mechanical bending test, tape-pull test, and ultrasonic bath test confirm the robust adhesion of the electrodes on glass and polymer substrates.
Original languageEnglish (US)
Pages (from-to)9807-9814
Number of pages8
JournalACS Nano
Volume8
Issue number10
DOIs
StatePublished - Aug 27 2014
Externally publishedYes

Bibliographical note

KAUST Repository Item: Exported on 2020-10-01
Acknowledgements: Partial support to the Laser Thermal Laboratory by the King Abdullah University of Science and Technology (KAUST) is acknowledged. Laser Prismatics LLC was supported by the SBIR Phase I Grant No. 1346088 from the U.S. National Science Foundation. D.L. was supported by Gachon University research fund of 2014(GCU-2014-0107). The authors also would like to thank Dr. Frances I. Allen (Lawrence Berkeley National Lab) for assistance in recording TEM images.
This publication acknowledges KAUST support, but has no KAUST affiliated authors.

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