Using soft lithography to pattern highly oriented polyacetylene (HOPA) films via solventless polymerization

Hongwei Gu; Rongkun Zheng; Xixiang Zhang; Bing Xu

doi:10.1002/adma.200400768

Using soft lithography to pattern highly oriented polyacetylene (HOPA) films via solventless polymerization

Hongwei Gu^*, Rongkun Zheng, Xixiang Zhang, Bing Xu

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

43 Scopus citations

Abstract

A new application of the combination of soft lithography and solventless polymerization was demonstrated. It was used to pattern ultra-hard microstructures in selected areas using the highly oriented polyacetylene (HOPA) films as the precursor. The application was found to lead the formation of highly oriented films of other polymers, including electro-optically active polymers that require a high orientation order to achieve enhanced device performance. The results show that HOPA films are slightly more hydrophobic.

Original language	English (US)
Pages (from-to)	1356-1359
Number of pages	4
Journal	Advanced Materials
Volume	16
Issue number	15 SPEC. ISS.
DOIs	https://doi.org/10.1002/adma.200400768
State	Published - Aug 3 2004
Externally published	Yes

ASJC Scopus subject areas

General Materials Science
Mechanics of Materials
Mechanical Engineering

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abstract = "A new application of the combination of soft lithography and solventless polymerization was demonstrated. It was used to pattern ultra-hard microstructures in selected areas using the highly oriented polyacetylene (HOPA) films as the precursor. The application was found to lead the formation of highly oriented films of other polymers, including electro-optically active polymers that require a high orientation order to achieve enhanced device performance. The results show that HOPA films are slightly more hydrophobic.",

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year = "2004",

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AU - Gu, Hongwei

AU - Zheng, Rongkun

AU - Zhang, Xixiang

AU - Xu, Bing

PY - 2004/8/3

Y1 - 2004/8/3

N2 - A new application of the combination of soft lithography and solventless polymerization was demonstrated. It was used to pattern ultra-hard microstructures in selected areas using the highly oriented polyacetylene (HOPA) films as the precursor. The application was found to lead the formation of highly oriented films of other polymers, including electro-optically active polymers that require a high orientation order to achieve enhanced device performance. The results show that HOPA films are slightly more hydrophobic.

AB - A new application of the combination of soft lithography and solventless polymerization was demonstrated. It was used to pattern ultra-hard microstructures in selected areas using the highly oriented polyacetylene (HOPA) films as the precursor. The application was found to lead the formation of highly oriented films of other polymers, including electro-optically active polymers that require a high orientation order to achieve enhanced device performance. The results show that HOPA films are slightly more hydrophobic.

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M3 - Article

AN - SCOPUS:4544335469

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JO - Advanced Materials

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IS - 15 SPEC. ISS.

ER -

Using soft lithography to pattern highly oriented polyacetylene (HOPA) films via solventless polymerization

Abstract

ASJC Scopus subject areas

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