Abstract
Reducing the thickness of an amorphous conductive indium tin oxide layer down to a few nanometres has enabled the realization of 40-nm-long channel transistors with remarkable operating characteristics.
Original language | English (US) |
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Pages (from-to) | 1033-1034 |
Number of pages | 2 |
Journal | Nature Materials |
Volume | 18 |
Issue number | 10 |
DOIs | |
State | Published - Sep 19 2019 |