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Treatment of ZnSe substrates for homoepitaxy
K. Ohkawa
, T. Karasawa, T. Mitsuyu
Research output
:
Contribution to journal
›
Article
›
peer-review
13
Scopus citations
Overview
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Engineering
Crystallinity
100%
Dry Etching
100%
Energy Electron Diffraction
100%
Low-Temperature
100%
Strain
100%
Temperature Range
100%
Material Science
Dry Etching
50%
Homoepitaxy
100%
Reflection High-Energy Electron Diffraction
50%
Keyphrases
In-plane Biaxial Strain
25%
Polishing Damage
25%
Thermal Etching
25%