Towards surface growth lithography using polymer bound photoactive acid generators

Zachary M. Fresco; J. M.J. Fréchet

doi:10.2494/photopolymer.16.23

Towards surface growth lithography using polymer bound photoactive acid generators

Zachary M. Fresco^*, J. M.J. Fréchet

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

Abstract

Surface growth lithography is an attractive technique that eliminates the need for resist transparency. Critical to the success of this method is a smooth and homogeneous film capable of immobilizing a high concentration of initiator on the surface. This report outlines the design, synthesis, and preliminary testing of a polymeric photoactive acid generator (PAG), which is suitable for use with cationic surface growth lithography.

Original language	English (US)
Pages (from-to)	23-26
Number of pages	4
Journal	Journal of Photopolymer Science and Technology
Volume	16
Issue number	1
DOIs	https://doi.org/10.2494/photopolymer.16.23
State	Published - 2003
Externally published	Yes

Keywords

Initiating surface
Polymeric photoacid generator

ASJC Scopus subject areas

Polymers and Plastics
Organic Chemistry
Materials Chemistry

Access to Document

10.2494/photopolymer.16.23

Cite this

@article{b5b7ab56b7ce4e769f8b60dbead903e5,

title = "Towards surface growth lithography using polymer bound photoactive acid generators",

abstract = "Surface growth lithography is an attractive technique that eliminates the need for resist transparency. Critical to the success of this method is a smooth and homogeneous film capable of immobilizing a high concentration of initiator on the surface. This report outlines the design, synthesis, and preliminary testing of a polymeric photoactive acid generator (PAG), which is suitable for use with cationic surface growth lithography.",

keywords = "Initiating surface, Polymeric photoacid generator",

author = "Fresco, {Zachary M.} and Fr{\'e}chet, {J. M.J.}",

year = "2003",

doi = "10.2494/photopolymer.16.23",

language = "English (US)",

volume = "16",

pages = "23--26",

journal = "Journal of Photopolymer Science and Technology",

issn = "0914-9244",

publisher = "Tokai University",

number = "1",

}

TY - JOUR

T1 - Towards surface growth lithography using polymer bound photoactive acid generators

AU - Fresco, Zachary M.

AU - Fréchet, J. M.J.

PY - 2003

Y1 - 2003

N2 - Surface growth lithography is an attractive technique that eliminates the need for resist transparency. Critical to the success of this method is a smooth and homogeneous film capable of immobilizing a high concentration of initiator on the surface. This report outlines the design, synthesis, and preliminary testing of a polymeric photoactive acid generator (PAG), which is suitable for use with cationic surface growth lithography.

AB - Surface growth lithography is an attractive technique that eliminates the need for resist transparency. Critical to the success of this method is a smooth and homogeneous film capable of immobilizing a high concentration of initiator on the surface. This report outlines the design, synthesis, and preliminary testing of a polymeric photoactive acid generator (PAG), which is suitable for use with cationic surface growth lithography.

KW - Initiating surface

KW - Polymeric photoacid generator

UR - http://www.scopus.com/inward/record.url?scp=0038506846&partnerID=8YFLogxK

U2 - 10.2494/photopolymer.16.23

DO - 10.2494/photopolymer.16.23

M3 - Article

AN - SCOPUS:0038506846

SN - 0914-9244

VL - 16

SP - 23

EP - 26

JO - Journal of Photopolymer Science and Technology

JF - Journal of Photopolymer Science and Technology

IS - 1

ER -

Towards surface growth lithography using polymer bound photoactive acid generators

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this