Thin films based on benzophenontetracarboxylic dianhydride and 4,4'-diamino-3,3'-dimethyldiphenylmethane

Ion Sava; Ştefan Chişcǎ; Maria Brumǎ; Gabriela Lisa; Cristina Buiculescu

doi:10.1109/SMICND.2010.5650719

Thin films based on benzophenontetracarboxylic dianhydride and 4,4'-diamino-3,3'-dimethyldiphenylmethane

Ion Sava^*, Ştefan Chişcǎ, Maria Brumǎ, Gabriela Lisa, Cristina Buiculescu

^*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

The thermal treatment of polyamidic acid films based on benzophenontetracarboxylic dianhydride and 4,4'-diamino-3,3'-dimethyl diphenylmethane, at different temperatures, led to polyimide structures having different degree of imidization. The thermal and dielectric characteristics of the films were investigated by using dynamic mechanical analysis, contact angles and dielectric spectroscopy measurements.

Original language	English (US)
Title of host publication	2010 33rd International Semiconductor Conference, CAS 2010 - Proceedings
Pages	305-308
Number of pages	4
DOIs	https://doi.org/10.1109/SMICND.2010.5650719
State	Published - 2010
Externally published	Yes
Event	2010 33rd International Semiconductor Conference, CAS 2010 - Sinaia, Romania Duration: Oct 11 2010 → Oct 13 2010

Publication series

Name	Proceedings of the International Semiconductor Conference, CAS
Volume	2

Conference

Conference	2010 33rd International Semiconductor Conference, CAS 2010
Country/Territory	Romania
City	Sinaia
Period	10/11/10 → 10/13/10

Keywords

Polyamidic acid
Polyimides
Thermal treatment
Thin films

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Electrical and Electronic Engineering

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10.1109/SMICND.2010.5650719

Cite this

Sava, I., Chişcǎ, Ş., Brumǎ, M., Lisa, G., & Buiculescu, C. (2010). Thin films based on benzophenontetracarboxylic dianhydride and 4,4'-diamino-3,3'-dimethyldiphenylmethane. In 2010 33rd International Semiconductor Conference, CAS 2010 - Proceedings (pp. 305-308). Article 5650719 (Proceedings of the International Semiconductor Conference, CAS; Vol. 2). https://doi.org/10.1109/SMICND.2010.5650719

@inproceedings{f1c348068d0b450d8264711a4cfff0d1,

title = "Thin films based on benzophenontetracarboxylic dianhydride and 4,4'-diamino-3,3'-dimethyldiphenylmethane",

abstract = "The thermal treatment of polyamidic acid films based on benzophenontetracarboxylic dianhydride and 4,4'-diamino-3,3'-dimethyl diphenylmethane, at different temperatures, led to polyimide structures having different degree of imidization. The thermal and dielectric characteristics of the films were investigated by using dynamic mechanical analysis, contact angles and dielectric spectroscopy measurements.",

keywords = "Polyamidic acid, Polyimides, Thermal treatment, Thin films",

author = "Ion Sava and {\c S}tefan Chi{\c s}cǎ and Maria Brumǎ and Gabriela Lisa and Cristina Buiculescu",

year = "2010",

doi = "10.1109/SMICND.2010.5650719",

language = "English (US)",

isbn = "9781424457816",

series = "Proceedings of the International Semiconductor Conference, CAS",

pages = "305--308",

booktitle = "2010 33rd International Semiconductor Conference, CAS 2010 - Proceedings",

note = "2010 33rd International Semiconductor Conference, CAS 2010 ; Conference date: 11-10-2010 Through 13-10-2010",

}

Sava, I, Chişcǎ, Ş, Brumǎ, M, Lisa, G & Buiculescu, C 2010, Thin films based on benzophenontetracarboxylic dianhydride and 4,4'-diamino-3,3'-dimethyldiphenylmethane. in 2010 33rd International Semiconductor Conference, CAS 2010 - Proceedings., 5650719, Proceedings of the International Semiconductor Conference, CAS, vol. 2, pp. 305-308, 2010 33rd International Semiconductor Conference, CAS 2010, Sinaia, Romania, 10/11/10. https://doi.org/10.1109/SMICND.2010.5650719

Thin films based on benzophenontetracarboxylic dianhydride and 4,4'-diamino-3,3'-dimethyldiphenylmethane. / Sava, Ion; Chişcǎ, Ştefan; Brumǎ, Maria et al.
2010 33rd International Semiconductor Conference, CAS 2010 - Proceedings. 2010. p. 305-308 5650719 (Proceedings of the International Semiconductor Conference, CAS; Vol. 2).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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AU - Sava, Ion

AU - Chişcǎ, Ştefan

AU - Brumǎ, Maria

AU - Lisa, Gabriela

AU - Buiculescu, Cristina

PY - 2010

Y1 - 2010

N2 - The thermal treatment of polyamidic acid films based on benzophenontetracarboxylic dianhydride and 4,4'-diamino-3,3'-dimethyl diphenylmethane, at different temperatures, led to polyimide structures having different degree of imidization. The thermal and dielectric characteristics of the films were investigated by using dynamic mechanical analysis, contact angles and dielectric spectroscopy measurements.

AB - The thermal treatment of polyamidic acid films based on benzophenontetracarboxylic dianhydride and 4,4'-diamino-3,3'-dimethyl diphenylmethane, at different temperatures, led to polyimide structures having different degree of imidization. The thermal and dielectric characteristics of the films were investigated by using dynamic mechanical analysis, contact angles and dielectric spectroscopy measurements.

KW - Polyamidic acid

KW - Polyimides

KW - Thermal treatment

KW - Thin films

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DO - 10.1109/SMICND.2010.5650719

M3 - Conference contribution

AN - SCOPUS:78651074131

SN - 9781424457816

T3 - Proceedings of the International Semiconductor Conference, CAS

SP - 305

EP - 308

BT - 2010 33rd International Semiconductor Conference, CAS 2010 - Proceedings

T2 - 2010 33rd International Semiconductor Conference, CAS 2010

Y2 - 11 October 2010 through 13 October 2010

ER -

Thin films based on benzophenontetracarboxylic dianhydride and 4,4'-diamino-3,3'-dimethyldiphenylmethane

Abstract

Publication series

Conference

Keywords

ASJC Scopus subject areas

Access to Document

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