Thermal annealing effects on a representative high-k/metal film stack

Engineering

• Complementary Metal-Oxide-Semiconductor 100%
• Semiconductor 50%
• Annealing Effect 50%
• Etch Rate 50%
• Metal Gate 50%
• Gate Dielectric 50%
• Refractive Index 50%
• Nitride 50%
• Atomic Layer Deposition 50%
• Thermal Annealing 50%
• Depletion 50%
• Sheet Resistance 50%
• Hafnium 50%
• Extinction Coefficient 50%
• Silicon Dioxide (Sio2) 50%
• Thickness 50%
• Surfaces 50%
• Properties 50%
• Density 50%
• Integration 50%
• Characteristics 50%
• Determines 50%
• Roughness 50%
• Silicon 50%