The impact of SiO₂/SiN_{\rm x} stack thickness on laser doping of silicon solar cell

Engineering

• Dielectric Film 100%
• Dielectric Window 66%
• Laser System 33%
• Passivation Layer 33%
• Metal Contact 33%
• Metallizations 33%
• Layer Thickness 33%
• Past Decade 33%
• Silicon Metal 33%
• Pulse Energy 33%
• Laser Parameter 33%
• Line Resistance 33%
• Dielectrics 33%

Keyphrases

• Laser Doping 100%
• Dielectric Window 66%
• Low Pulse Energy 33%
• Undoped Silicon 33%
• Silicon Metal 33%
• Pulse Distance 33%
• Energy Distance 33%
• Metallization Process 33%

Material Science

• Dielectric Material 100%
• Dielectric Films 100%
• Electrical Resistivity 33%
• Antireflection Coating 33%