The effect of metal thickness, overlayer and high-k surface treatment on the effective work function of metal electrode

K. Choi; H. C. Wen; H. Alshareef; R. Harris; P. Lysaght; H. Luan; P. Majhi; B. H. Lee

doi:10.1109/ESSDER.2005.1546595

The effect of metal thickness, overlayer and high-k surface treatment on the effective work function of metal electrode

K. Choi^*, H. C. Wen, H. Alshareef, R. Harris, P. Lysaght, H. Luan, P. Majhi, B. H. Lee

^*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

39 Scopus citations

Abstract

We demonstrate that the effective work function (EWF) of atomic layer deposited (ALD) TiN electrodes is a function of the TiN film thickness and that the metal/dielectric interface and the bulk metal film influence this measured response. It is shown that anneal treatments and chemical processing of the underlying dielectric surface prior to electrode deposition may be exploited to modify the effective work function of metal electrodes. The effect of physical vapor deposited (PVD) and ALD metal over-layers on the effective work function of metal electrodes is also presented.

Original language	English (US)
Title of host publication	Proceedings of ESSDERC 2005
Subtitle of host publication	35th European Solid-State Device Research Conference
Pages	101-104
Number of pages	4
DOIs	https://doi.org/10.1109/ESSDER.2005.1546595
State	Published - 2005
Externally published	Yes
Event	ESSDERC 2005: 35th European Solid-State Device Research Conference - Grenoble, France Duration: Sep 12 2005 → Sep 16 2005

Publication series

Name	Proceedings of ESSDERC 2005: 35th European Solid-State Device Research Conference
Volume	2005

Other

Other	ESSDERC 2005: 35th European Solid-State Device Research Conference
Country/Territory	France
City	Grenoble
Period	09/12/05 → 09/16/05

ASJC Scopus subject areas

General Engineering

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10.1109/ESSDER.2005.1546595

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Choi, K., Wen, H. C., Alshareef, H., Harris, R., Lysaght, P., Luan, H., Majhi, P., & Lee, B. H. (2005). The effect of metal thickness, overlayer and high-k surface treatment on the effective work function of metal electrode. In Proceedings of ESSDERC 2005: 35th European Solid-State Device Research Conference (pp. 101-104). Article 1546595 (Proceedings of ESSDERC 2005: 35th European Solid-State Device Research Conference; Vol. 2005). https://doi.org/10.1109/ESSDER.2005.1546595

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title = "The effect of metal thickness, overlayer and high-k surface treatment on the effective work function of metal electrode",

abstract = "We demonstrate that the effective work function (EWF) of atomic layer deposited (ALD) TiN electrodes is a function of the TiN film thickness and that the metal/dielectric interface and the bulk metal film influence this measured response. It is shown that anneal treatments and chemical processing of the underlying dielectric surface prior to electrode deposition may be exploited to modify the effective work function of metal electrodes. The effect of physical vapor deposited (PVD) and ALD metal over-layers on the effective work function of metal electrodes is also presented.",

author = "K. Choi and Wen, {H. C.} and H. Alshareef and R. Harris and P. Lysaght and H. Luan and P. Majhi and Lee, {B. H.}",

year = "2005",

doi = "10.1109/ESSDER.2005.1546595",

language = "English (US)",

isbn = "0780392035",

series = "Proceedings of ESSDERC 2005: 35th European Solid-State Device Research Conference",

pages = "101--104",

booktitle = "Proceedings of ESSDERC 2005",

note = "ESSDERC 2005: 35th European Solid-State Device Research Conference ; Conference date: 12-09-2005 Through 16-09-2005",

}

Choi, K, Wen, HC, Alshareef, H, Harris, R, Lysaght, P, Luan, H, Majhi, P & Lee, BH 2005, The effect of metal thickness, overlayer and high-k surface treatment on the effective work function of metal electrode. in Proceedings of ESSDERC 2005: 35th European Solid-State Device Research Conference., 1546595, Proceedings of ESSDERC 2005: 35th European Solid-State Device Research Conference, vol. 2005, pp. 101-104, ESSDERC 2005: 35th European Solid-State Device Research Conference, Grenoble, France, 09/12/05. https://doi.org/10.1109/ESSDER.2005.1546595

The effect of metal thickness, overlayer and high-k surface treatment on the effective work function of metal electrode. / Choi, K.; Wen, H. C.; Alshareef, H. et al.
Proceedings of ESSDERC 2005: 35th European Solid-State Device Research Conference. 2005. p. 101-104 1546595 (Proceedings of ESSDERC 2005: 35th European Solid-State Device Research Conference; Vol. 2005).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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AU - Wen, H. C.

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AU - Harris, R.

AU - Lysaght, P.

AU - Luan, H.

AU - Majhi, P.

AU - Lee, B. H.

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N2 - We demonstrate that the effective work function (EWF) of atomic layer deposited (ALD) TiN electrodes is a function of the TiN film thickness and that the metal/dielectric interface and the bulk metal film influence this measured response. It is shown that anneal treatments and chemical processing of the underlying dielectric surface prior to electrode deposition may be exploited to modify the effective work function of metal electrodes. The effect of physical vapor deposited (PVD) and ALD metal over-layers on the effective work function of metal electrodes is also presented.

AB - We demonstrate that the effective work function (EWF) of atomic layer deposited (ALD) TiN electrodes is a function of the TiN film thickness and that the metal/dielectric interface and the bulk metal film influence this measured response. It is shown that anneal treatments and chemical processing of the underlying dielectric surface prior to electrode deposition may be exploited to modify the effective work function of metal electrodes. The effect of physical vapor deposited (PVD) and ALD metal over-layers on the effective work function of metal electrodes is also presented.

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DO - 10.1109/ESSDER.2005.1546595

M3 - Conference contribution

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T3 - Proceedings of ESSDERC 2005: 35th European Solid-State Device Research Conference

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BT - Proceedings of ESSDERC 2005

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ER -

Choi K, Wen HC, Alshareef H, Harris R, Lysaght P, Luan H et al. The effect of metal thickness, overlayer and high-k surface treatment on the effective work function of metal electrode. In Proceedings of ESSDERC 2005: 35th European Solid-State Device Research Conference. 2005. p. 101-104. 1546595. (Proceedings of ESSDERC 2005: 35th European Solid-State Device Research Conference). doi: 10.1109/ESSDER.2005.1546595

The effect of metal thickness, overlayer and high-k surface treatment on the effective work function of metal electrode

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