Temperature-Dependent Kinetics of Ozone Production in Oxygen Discharges

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1 Scopus citations


Ozone has been widely used for its disinfection properties ever since its efficient production was made possible by plasma discharges. To-date, many experimental and modeling studies have been—and still are—dedicated to further improve the O3 production efficiency. Early on, it became clear that heat has a detrimental effect. Hence, little attention has been paid to the temperature-dependence of the plasma chemistry. However, with the increased use of O2 as (co-)reactant for plasma-based processes at elevated temperatures, this becomes essential. Therefore, we developed a reaction mechanism to study the temperature-dependence of the O2/O3 (plasma) chemistry. Here, we present the experimental validation of this mechanism and an analysis of the different O3 production trends as a function of gas temperature (300–590 K) and discharge power (5–20 W). Through improving key ozone reactions and electron impact dissociation processes, our mechanism could well-predict all experimentally observed trends. Our analysis revealed the importance of the electronic excited states of O2 and how the temperature-dependence of the plasma-based O3 production is highly dependent on the discharge power. Therefore, we believe that this work can contribute to a better understanding of the underlying physicochemical mechanisms of any O2/O3-containing (plasma) process operating at elevated temperatures. Nevertheless, our work also revealed the need for more accurate and comprehensive data with respect to the production and consumption of the electronic excited states of O2.
Original languageEnglish (US)
JournalPlasma Chemistry and Plasma Processing
StatePublished - Aug 26 2023

Bibliographical note

KAUST Repository Item: Exported on 2023-08-31
Acknowledged KAUST grant number(s): BAS/1/1384-01-01
Acknowledgements: The research reported in this work was funded by King Abdullah University of Science and Technology (KAUST) under award number BAS/1/1384-01-01.

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Chemical Engineering(all)
  • Chemistry(all)
  • Condensed Matter Physics


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