Syntheses and structures of novel hafnium chloroamido mono-amidinate and mono-guanidinate as precursors for HfO2 thin film

Mohamad Eleter; L. G. Hubert-Pfalzgraf; Stéphane Daniele; Guillaume Pilet; Bernand Tinant

doi:10.1016/j.poly.2010.05.023

Syntheses and structures of novel hafnium chloroamido mono-amidinate and mono-guanidinate as precursors for HfO₂ thin film

Mohamad Eleter, L. G. Hubert-Pfalzgraf, Stéphane Daniele^*, Guillaume Pilet, Bernand Tinant

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

15 Scopus citations

Abstract

The reactions between HfCl₂[N(SiMe₃) ₂]₂ and one or two equivalents of [ⁱPrNC(Me) NⁱPr]Li and ⁱPr-NCN-ⁱPr, at room temperature in toluene, gave the novel chloroamido-amidinato-hafnium HfCl[N(SiMe ₃)₂]₂[ⁱPrNC(Me)NⁱPr] (1) and chloroamido-guanidinato-hafnium HfCl₂[N(SiMe₃) ₂][ⁱPrNC(N(SiMe₃)₂)NⁱPr] (2) compounds, respectively. Compounds 1 and 2 were characterized by NMR and X-ray single crystal diffraction analysis. Their reaction towards alcohol was studied in order to check the dependency between molecular structure and HfO₂ Atomic Layer Deposition (ALD) specifications.

Original language	English (US)
Pages (from-to)	2522-2526
Number of pages	5
Journal	Polyhedron
Volume	29
Issue number	12
DOIs	https://doi.org/10.1016/j.poly.2010.05.023
State	Published - Aug 11 2010

Keywords

Amidinate
Guanidinate
Hafnium

ASJC Scopus subject areas

Physical and Theoretical Chemistry
Inorganic Chemistry
Materials Chemistry

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10.1016/j.poly.2010.05.023

Cite this

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title = "Syntheses and structures of novel hafnium chloroamido mono-amidinate and mono-guanidinate as precursors for HfO2 thin film",

abstract = "The reactions between HfCl2[N(SiMe3) 2]2 and one or two equivalents of [iPrNC(Me) NiPr]Li and iPr-NCN-iPr, at room temperature in toluene, gave the novel chloroamido-amidinato-hafnium HfCl[N(SiMe 3)2]2[iPrNC(Me)NiPr] (1) and chloroamido-guanidinato-hafnium HfCl2[N(SiMe3) 2][iPrNC(N(SiMe3)2)NiPr] (2) compounds, respectively. Compounds 1 and 2 were characterized by NMR and X-ray single crystal diffraction analysis. Their reaction towards alcohol was studied in order to check the dependency between molecular structure and HfO2 Atomic Layer Deposition (ALD) specifications.",

keywords = "Amidinate, Guanidinate, Hafnium",

author = "Mohamad Eleter and Hubert-Pfalzgraf, {L. G.} and St{\'e}phane Daniele and Guillaume Pilet and Bernand Tinant",

year = "2010",

month = aug,

day = "11",

doi = "10.1016/j.poly.2010.05.023",

language = "English (US)",

volume = "29",

pages = "2522--2526",

journal = "Polyhedron",

issn = "0277-5387",

publisher = "Elsevier",

number = "12",

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TY - JOUR

T1 - Syntheses and structures of novel hafnium chloroamido mono-amidinate and mono-guanidinate as precursors for HfO2 thin film

AU - Eleter, Mohamad

AU - Hubert-Pfalzgraf, L. G.

AU - Daniele, Stéphane

AU - Pilet, Guillaume

AU - Tinant, Bernand

PY - 2010/8/11

Y1 - 2010/8/11

N2 - The reactions between HfCl2[N(SiMe3) 2]2 and one or two equivalents of [iPrNC(Me) NiPr]Li and iPr-NCN-iPr, at room temperature in toluene, gave the novel chloroamido-amidinato-hafnium HfCl[N(SiMe 3)2]2[iPrNC(Me)NiPr] (1) and chloroamido-guanidinato-hafnium HfCl2[N(SiMe3) 2][iPrNC(N(SiMe3)2)NiPr] (2) compounds, respectively. Compounds 1 and 2 were characterized by NMR and X-ray single crystal diffraction analysis. Their reaction towards alcohol was studied in order to check the dependency between molecular structure and HfO2 Atomic Layer Deposition (ALD) specifications.

AB - The reactions between HfCl2[N(SiMe3) 2]2 and one or two equivalents of [iPrNC(Me) NiPr]Li and iPr-NCN-iPr, at room temperature in toluene, gave the novel chloroamido-amidinato-hafnium HfCl[N(SiMe 3)2]2[iPrNC(Me)NiPr] (1) and chloroamido-guanidinato-hafnium HfCl2[N(SiMe3) 2][iPrNC(N(SiMe3)2)NiPr] (2) compounds, respectively. Compounds 1 and 2 were characterized by NMR and X-ray single crystal diffraction analysis. Their reaction towards alcohol was studied in order to check the dependency between molecular structure and HfO2 Atomic Layer Deposition (ALD) specifications.

KW - Amidinate

KW - Guanidinate

KW - Hafnium

UR - http://www.scopus.com/inward/record.url?scp=77955425078&partnerID=8YFLogxK

U2 - 10.1016/j.poly.2010.05.023

DO - 10.1016/j.poly.2010.05.023

M3 - Article

AN - SCOPUS:77955425078

SN - 0277-5387

VL - 29

SP - 2522

EP - 2526

JO - Polyhedron

JF - Polyhedron

IS - 12

ER -