Susceptor

Xiaohang Li; Kuang-Hui Li; Hamad S. Alotaibi

Susceptor

Xiaohang Li (Inventor), Kuang-Hui Li (Inventor), Hamad S. Alotaibi (Inventor)

Research output: Patent

Abstract

A susceptor device for a chemical vapor deposition (CVD) reactor including metal organic CVD (MOCVD) used in the semiconductor industry. The susceptor device particularly is used with induction heating and includes a horizontal plate adapted for holding one or more wafers and a vertical rod around which the induction heating coils are disposed. A screw system and an insulator can further be used. This design helps prevent undesired levitation and allows for the gas injectors of the reactors to be placed closer to the wafer for deposition during high-temperature deposition processes at susceptor surface temperatures of about 1500°C or higher.

Original language	English (US)
Patent number	WO2018051304A1
State	Published - Mar 22 2018

Bibliographical note

KAUST Repository Item: Exported on 2019-02-13

Access to Document

https://repository.kaust.edu.sa/bitstream/10754/629657/1/WO2018051304A1.pdf

Cite this

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title = "Susceptor",

abstract = "A susceptor device for a chemical vapor deposition (CVD) reactor including metal organic CVD (MOCVD) used in the semiconductor industry. The susceptor device particularly is used with induction heating and includes a horizontal plate adapted for holding one or more wafers and a vertical rod around which the induction heating coils are disposed. A screw system and an insulator can further be used. This design helps prevent undesired levitation and allows for the gas injectors of the reactors to be placed closer to the wafer for deposition during high-temperature deposition processes at susceptor surface temperatures of about 1500°C or higher.",

author = "Xiaohang Li and Kuang-Hui Li and Alotaibi, {Hamad S.}",

note = "KAUST Repository Item: Exported on 2019-02-13; WO2018051304A1",

year = "2018",

month = mar,

day = "22",

language = "English (US)",

type = "Patent",

}

TY - PAT

T1 - Susceptor

AU - Li, Xiaohang

AU - Li, Kuang-Hui

AU - Alotaibi, Hamad S.

N1 - KAUST Repository Item: Exported on 2019-02-13

PY - 2018/3/22

Y1 - 2018/3/22

N2 - A susceptor device for a chemical vapor deposition (CVD) reactor including metal organic CVD (MOCVD) used in the semiconductor industry. The susceptor device particularly is used with induction heating and includes a horizontal plate adapted for holding one or more wafers and a vertical rod around which the induction heating coils are disposed. A screw system and an insulator can further be used. This design helps prevent undesired levitation and allows for the gas injectors of the reactors to be placed closer to the wafer for deposition during high-temperature deposition processes at susceptor surface temperatures of about 1500°C or higher.

AB - A susceptor device for a chemical vapor deposition (CVD) reactor including metal organic CVD (MOCVD) used in the semiconductor industry. The susceptor device particularly is used with induction heating and includes a horizontal plate adapted for holding one or more wafers and a vertical rod around which the induction heating coils are disposed. A screw system and an insulator can further be used. This design helps prevent undesired levitation and allows for the gas injectors of the reactors to be placed closer to the wafer for deposition during high-temperature deposition processes at susceptor surface temperatures of about 1500°C or higher.

UR - http://hdl.handle.net/10754/629657

UR - https://patents.google.com/patent/WO2018051304A1/en

M3 - Patent

M1 - WO2018051304A1

ER -

Susceptor

Abstract

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