TY - GEN
T1 - Surfactant mediated slurry formulations for Ge CMP applications
AU - Basim, G. Bahar
AU - Karagöz, Ayşe
AU - Chen, Long
AU - Vakarelski, Ivan Uriev
N1 - KAUST Repository Item: Exported on 2020-10-01
PY - 2013/8/13
Y1 - 2013/8/13
N2 - In this study, slurry formulations in the presence of self-assembled surfactant structures were investigated for Ge/SiO2 CMP applications in the absence and presence of oxidizers. Both anionic (sodium dodecyl sulfate-SDS) and cationic (cetyl trimethyl ammonium bromide-C12TAB) micelles were used in the slurry formulations as a function of pH and oxidizer concentration. CMP performances of Ge and SiO2 wafers were evaluated in terms of material removal rates, selectivity and surface quality. The material removal rate responses were also assessed through AFM wear rate tests to obtain a faster response for preliminary analyses. The surfactant adsorption characteristics were studied through surface wettability responses of the Ge and SiO2 wafers through contact angle measurements. It was observed that the self-assembled surfactant structures can help obtain selectivity on the silica/germanium system at low concentrations of the oxidizer in the slurry. © 2013 Materials Research Society.
AB - In this study, slurry formulations in the presence of self-assembled surfactant structures were investigated for Ge/SiO2 CMP applications in the absence and presence of oxidizers. Both anionic (sodium dodecyl sulfate-SDS) and cationic (cetyl trimethyl ammonium bromide-C12TAB) micelles were used in the slurry formulations as a function of pH and oxidizer concentration. CMP performances of Ge and SiO2 wafers were evaluated in terms of material removal rates, selectivity and surface quality. The material removal rate responses were also assessed through AFM wear rate tests to obtain a faster response for preliminary analyses. The surfactant adsorption characteristics were studied through surface wettability responses of the Ge and SiO2 wafers through contact angle measurements. It was observed that the self-assembled surfactant structures can help obtain selectivity on the silica/germanium system at low concentrations of the oxidizer in the slurry. © 2013 Materials Research Society.
UR - http://hdl.handle.net/10754/564670
UR - https://www.cambridge.org/core/product/identifier/S1946427413009718/type/journal_article
UR - http://www.scopus.com/inward/record.url?scp=84899822148&partnerID=8YFLogxK
U2 - 10.1557/opl.2013.971
DO - 10.1557/opl.2013.971
M3 - Conference contribution
SN - 9781632661425
SP - 73
EP - 78
BT - MRS Proceedings
PB - Cambridge University Press (CUP)
ER -