Surface Organometallic Chemistry of Inorganic Oxides: The Synthesis and Characterization of (≡SiO)Ta(=CHC(CH3)3)(CH2C(CH3)3)2and (≡SiO)2Ta(=CHC(CH3)3)(CH2C(CH3)3)

Véronique Dufaud, Gerald P. Niccolai, Jean Thivolle-Cazat, Jean Marie Basset*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

86 Scopus citations


The synthesis of two silica-supported tantalum(V) carbene complexes is reported. The reaction of Ta- (=CHC(CH3)3)(CH2C(CH3)3)3 (1) with a silica dehydroxylated at 500 °C produces a mixture of (≡SiO)Ta(=CHC-(CH3)3)(CH2C(CH3)3)2(2a) and (≡SiO)2Ta(=CHC(CH3)3)(CH2C(CH3)3) (2b) and neopentane gas (on average 1.3 equiv/equiv of tantalum). The reaction of 2a/2b with water produces 2.6 mol of neopentane. The reaction of 2a/2b with acetone produces 1 equiv of 2,4,4-trimethyl-2-pentene per grafted tantalum, indicating that 2a,b each bear one carbene ligand. When 1 is reacted with fully (>90%) deuterated silica, the product neopentane is only 38% monodeuterated. The product of this reaction (2deut) is hydrolyzed with D2O to produce 2.6 equiv (per Ta) of neopentane as a mixture of neopentane-d0, -d1, -d2, and -d3 (3.3:54.4:36.7:5.5). The presence of neopentane-d3 is evidence for the incorporation of deuterium into the tantalum surface complex during the synthesis of 2a/2b. The volatile product of the reaction of 2deut with acetone is 1 equiv of 2,4,4-trimethyl-2-pentene which is 15% monodeuterated, demonstrating some incorporation of deuterium in the carbenic positions of 2deut. The isotopomeric distribution in the volatile products of these reactions is traced to a mechanism of formation of 2a,b in which the first reaction of surface silanol with 1 is the addition of O—H across the Ta=C double bond.

Original languageEnglish (US)
Pages (from-to)4288-4294
Number of pages7
JournalJournal of the American Chemical Society
Issue number15
StatePublished - Apr 1995
Externally publishedYes

ASJC Scopus subject areas

  • Catalysis
  • General Chemistry
  • Biochemistry
  • Colloid and Surface Chemistry


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