Sub-micron structured metal oxide gas sensors by means of lithographic techniques

Patrizio Candeloro*, Camilla Baratto, Elisabetta Comini, Guido Faglia, Enzo M. Di Fabrizio, Giorgio Sberveglieri

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review


In this work we employed lithographic techniques, combined with sputtering depositions, to fabricate semiconductor metal-oxide (MOX) gas sensors with controlled grain dimensions. The basic idea is to replace the continuous sensing film of standard MOX sensors with a pattern of wires in the sub-micron scale, thus controlling the lateral size of the grains. Regarding the fabrication process, we followed two different approaches: a plain lift-off technique and a substrate patterning process. We present a comparison between the results of both the approaches. Furthermore, we tested the electrical responses to several gases and compared them with those of continuous film sensors. The experimental data highlight an improvement for the patterned sensors.

Original languageEnglish (US)
Article numberA2.8
Pages (from-to)103-108
Number of pages6
JournalMaterials Research Society Symposium Proceedings
StatePublished - 2005
Externally publishedYes
EventSemiconductor Materials for Sensing - Boston, MA, United States
Duration: Nov 29 2004Dec 2 2004

ASJC Scopus subject areas

  • General Materials Science
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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