Sub-micron structured metal oxide gas sensors by means of lithographic techniques

Patrizio Candeloro; Camilla Baratto; Elisabetta Comini; Guido Faglia; Enzo M. Di Fabrizio; Giorgio Sberveglieri

Sub-micron structured metal oxide gas sensors by means of lithographic techniques

Patrizio Candeloro^*, Camilla Baratto, Elisabetta Comini, Guido Faglia, Enzo M. Di Fabrizio, Giorgio Sberveglieri

^*Corresponding author for this work

Research output: Contribution to journal › Conference article › peer-review

Abstract

In this work we employed lithographic techniques, combined with sputtering depositions, to fabricate semiconductor metal-oxide (MOX) gas sensors with controlled grain dimensions. The basic idea is to replace the continuous sensing film of standard MOX sensors with a pattern of wires in the sub-micron scale, thus controlling the lateral size of the grains. Regarding the fabrication process, we followed two different approaches: a plain lift-off technique and a substrate patterning process. We present a comparison between the results of both the approaches. Furthermore, we tested the electrical responses to several gases and compared them with those of continuous film sensors. The experimental data highlight an improvement for the patterned sensors.

Original language	English (US)
Article number	A2.8
Pages (from-to)	103-108
Number of pages	6
Journal	Materials Research Society Symposium Proceedings
Volume	828
State	Published - 2005
Externally published	Yes
Event	Semiconductor Materials for Sensing - Boston, MA, United States Duration: Nov 29 2004 → Dec 2 2004

ASJC Scopus subject areas

General Materials Science
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

Cite this

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title = "Sub-micron structured metal oxide gas sensors by means of lithographic techniques",

abstract = "In this work we employed lithographic techniques, combined with sputtering depositions, to fabricate semiconductor metal-oxide (MOX) gas sensors with controlled grain dimensions. The basic idea is to replace the continuous sensing film of standard MOX sensors with a pattern of wires in the sub-micron scale, thus controlling the lateral size of the grains. Regarding the fabrication process, we followed two different approaches: a plain lift-off technique and a substrate patterning process. We present a comparison between the results of both the approaches. Furthermore, we tested the electrical responses to several gases and compared them with those of continuous film sensors. The experimental data highlight an improvement for the patterned sensors.",

author = "Patrizio Candeloro and Camilla Baratto and Elisabetta Comini and Guido Faglia and {Di Fabrizio}, {Enzo M.} and Giorgio Sberveglieri",

year = "2005",

language = "English (US)",

volume = "828",

pages = "103--108",

journal = "Materials Research Society Symposium Proceedings",

issn = "0272-9172",

publisher = "Materials Research Society",

note = "Semiconductor Materials for Sensing ; Conference date: 29-11-2004 Through 02-12-2004",

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TY - JOUR

T1 - Sub-micron structured metal oxide gas sensors by means of lithographic techniques

AU - Candeloro, Patrizio

AU - Baratto, Camilla

AU - Comini, Elisabetta

AU - Faglia, Guido

AU - Di Fabrizio, Enzo M.

AU - Sberveglieri, Giorgio

PY - 2005

Y1 - 2005

N2 - In this work we employed lithographic techniques, combined with sputtering depositions, to fabricate semiconductor metal-oxide (MOX) gas sensors with controlled grain dimensions. The basic idea is to replace the continuous sensing film of standard MOX sensors with a pattern of wires in the sub-micron scale, thus controlling the lateral size of the grains. Regarding the fabrication process, we followed two different approaches: a plain lift-off technique and a substrate patterning process. We present a comparison between the results of both the approaches. Furthermore, we tested the electrical responses to several gases and compared them with those of continuous film sensors. The experimental data highlight an improvement for the patterned sensors.

AB - In this work we employed lithographic techniques, combined with sputtering depositions, to fabricate semiconductor metal-oxide (MOX) gas sensors with controlled grain dimensions. The basic idea is to replace the continuous sensing film of standard MOX sensors with a pattern of wires in the sub-micron scale, thus controlling the lateral size of the grains. Regarding the fabrication process, we followed two different approaches: a plain lift-off technique and a substrate patterning process. We present a comparison between the results of both the approaches. Furthermore, we tested the electrical responses to several gases and compared them with those of continuous film sensors. The experimental data highlight an improvement for the patterned sensors.

UR - http://www.scopus.com/inward/record.url?scp=20344387683&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:20344387683

SN - 0272-9172

VL - 828

SP - 103

EP - 108

JO - Materials Research Society Symposium Proceedings

JF - Materials Research Society Symposium Proceedings

M1 - A2.8

T2 - Semiconductor Materials for Sensing

Y2 - 29 November 2004 through 2 December 2004

ER -

Sub-micron structured metal oxide gas sensors by means of lithographic techniques

Abstract

ASJC Scopus subject areas

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