Sub-250 nm low-threshold deep-ultraviolet AlGaN-based heterostructure laser employing HfO2/SiO2 dielectric mirrors

Tsung Ting Kao, Yuh Shiuan Liu, Md Mahbub Satter, Xiao Hang Li, Zachary Lochner, P. Douglas Yoder, Theeradetch Detchprohm, Russell D. Dupuis, Shyh Chiang Shen*, Jae Hyun Ryou, Alec M. Fischer, Yong Wei, Hongen Xie, Fernando A. Ponce

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

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