Sub-15 nm nano-pattern generation by spacer width control for high density precisely positioned self-assembled device nanomanufacturing

Engineering

• Base Structure 100%
• Fabrication 66%
• Side Wall 66%
• Integration 66%
• High Density 66%
• Microfabrication 33%
• Thin Films 33%
• Complementary Metal-Oxide-Semiconductor 33%
• Nanoelectronics 33%
• Compatibility 33%
• Nitride 33%
• High Integration Density 33%
• Optical Lithography 33%
• Position Control 33%
• Thickness 33%
• Demonstrates 33%
• Nodes 33%
• Silicon 33%
• Nanomanufacturing System 33%