Keyphrases
Sidewall Spacer
100%
Pattern Generation
100%
Nanopatterning
100%
Self-assembled Devices
100%
Nanogap
100%
Nanodevices
100%
Vertical Sidewall
100%
Width Control
100%
Bottom-up Fabrication
50%
Device Integration
50%
Microfabrication
50%
Control Accuracy
50%
Precision Position Control
50%
High-density Integration
50%
Optical Lithography
50%
Heterogeneous Integration
50%
32nm Node
50%
Self-assembling
50%
Engineering
Base Structure
100%
Nanomanufacturing System
100%
Side Wall
66%
Microfabrication
33%
Complementary Metal-Oxide-Semiconductor
33%
Nanoelectronics
33%
Nitride
33%
High Integration Density
33%
Optical Lithography
33%
Position Control
33%
Demonstrates
33%
Nodes
33%
Thin Films
33%
Chemical Engineering
Microfabrication
100%
Silicon Nitride
100%
Oxide Semiconductors
100%
Lithography
100%
Nanomanufacturing System
100%
Material Science
Density
100%
Silicon Nitride
66%
Complementary Metal-Oxide-Semiconductor Device
33%
Nanoelectronics
33%
Nanodevices
33%
Device Integration
33%
Microfabrication
33%
Optical Lithography
33%
Reactive Ion Etching
33%
Thin Films
33%