Studying the Mechanism of Hybrid Nanoparticle Photoresists: Effect of Particle Size on Photopatterning

Li Li; Souvik Chakrabarty; Konstantinos Spyrou; Christopher K. Ober; Emmanuel P. Giannelis

doi:10.1021/acs.chemmater.5b01506

Studying the Mechanism of Hybrid Nanoparticle Photoresists: Effect of Particle Size on Photopatterning

Li Li, Souvik Chakrabarty, Konstantinos Spyrou, Christopher K. Ober, Emmanuel P. Giannelis

Research output: Contribution to journal › Article › peer-review

91 Scopus citations

Abstract

© 2015 American Chemical Society. Hf-based hybrid photoresist materials with three different organic ligands were prepared by a sol-gel-based method, and their patterning mechanism was investigated in detail. All hybrid nanoparticle resists are patternable using UV exposure. Their particle sizes show a dramatic increase from the initial 3-4 nm to submicron size after exposure, with no apparent inorganic content or thermal property change detected. XPS results showed that the mass percentage of the carboxylic group in the structure of nanoparticles decreased with increasing exposure duration. The particle coarsening sensitivities of those hybrid nanoparticles are consistent with their EUV performance. The current work provides an understanding for the development mechanism and future guidance for the design and processing of high performance resist materials for large-scale microelectronics device fabrication.

Original language	English (US)
Pages (from-to)	5027-5031
Number of pages	5
Journal	Chemistry of Materials
Volume	27
Issue number	14
DOIs	https://doi.org/10.1021/acs.chemmater.5b01506
State	Published - Jul 13 2015
Externally published	Yes

Bibliographical note

KAUST Repository Item: Exported on 2020-10-01
Acknowledgements: The authors gratefully acknowledge the funding support from SEMATECH and facilities support from Lawrence Berkeley National Laboratory (LBNL), Cornell Nanoscale Science and Technology (CNF), the Cornell Center for Materials Research (CCMR), and the KAUST-Cornell Center of Energy and Sustainability (KAUST-CU).
This publication acknowledges KAUST support, but has no KAUST affiliated authors.

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10.1021/acs.chemmater.5b01506

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@article{a20d33fdaf5d41f0806e5db88a0ec2eb,

title = "Studying the Mechanism of Hybrid Nanoparticle Photoresists: Effect of Particle Size on Photopatterning",

abstract = "{\textcopyright} 2015 American Chemical Society. Hf-based hybrid photoresist materials with three different organic ligands were prepared by a sol-gel-based method, and their patterning mechanism was investigated in detail. All hybrid nanoparticle resists are patternable using UV exposure. Their particle sizes show a dramatic increase from the initial 3-4 nm to submicron size after exposure, with no apparent inorganic content or thermal property change detected. XPS results showed that the mass percentage of the carboxylic group in the structure of nanoparticles decreased with increasing exposure duration. The particle coarsening sensitivities of those hybrid nanoparticles are consistent with their EUV performance. The current work provides an understanding for the development mechanism and future guidance for the design and processing of high performance resist materials for large-scale microelectronics device fabrication.",

author = "Li Li and Souvik Chakrabarty and Konstantinos Spyrou and Ober, {Christopher K.} and Giannelis, {Emmanuel P.}",

note = "KAUST Repository Item: Exported on 2020-10-01 Acknowledgements: The authors gratefully acknowledge the funding support from SEMATECH and facilities support from Lawrence Berkeley National Laboratory (LBNL), Cornell Nanoscale Science and Technology (CNF), the Cornell Center for Materials Research (CCMR), and the KAUST-Cornell Center of Energy and Sustainability (KAUST-CU). This publication acknowledges KAUST support, but has no KAUST affiliated authors.",

year = "2015",

month = jul,

day = "13",

doi = "10.1021/acs.chemmater.5b01506",

language = "English (US)",

volume = "27",

pages = "5027--5031",

journal = "Chemistry of Materials",

issn = "0897-4756",

publisher = "American Chemical Society",

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T1 - Studying the Mechanism of Hybrid Nanoparticle Photoresists: Effect of Particle Size on Photopatterning

AU - Li, Li

AU - Chakrabarty, Souvik

AU - Spyrou, Konstantinos

AU - Ober, Christopher K.

AU - Giannelis, Emmanuel P.

N1 - KAUST Repository Item: Exported on 2020-10-01 Acknowledgements: The authors gratefully acknowledge the funding support from SEMATECH and facilities support from Lawrence Berkeley National Laboratory (LBNL), Cornell Nanoscale Science and Technology (CNF), the Cornell Center for Materials Research (CCMR), and the KAUST-Cornell Center of Energy and Sustainability (KAUST-CU). This publication acknowledges KAUST support, but has no KAUST affiliated authors.

PY - 2015/7/13

Y1 - 2015/7/13

N2 - © 2015 American Chemical Society. Hf-based hybrid photoresist materials with three different organic ligands were prepared by a sol-gel-based method, and their patterning mechanism was investigated in detail. All hybrid nanoparticle resists are patternable using UV exposure. Their particle sizes show a dramatic increase from the initial 3-4 nm to submicron size after exposure, with no apparent inorganic content or thermal property change detected. XPS results showed that the mass percentage of the carboxylic group in the structure of nanoparticles decreased with increasing exposure duration. The particle coarsening sensitivities of those hybrid nanoparticles are consistent with their EUV performance. The current work provides an understanding for the development mechanism and future guidance for the design and processing of high performance resist materials for large-scale microelectronics device fabrication.

AB - © 2015 American Chemical Society. Hf-based hybrid photoresist materials with three different organic ligands were prepared by a sol-gel-based method, and their patterning mechanism was investigated in detail. All hybrid nanoparticle resists are patternable using UV exposure. Their particle sizes show a dramatic increase from the initial 3-4 nm to submicron size after exposure, with no apparent inorganic content or thermal property change detected. XPS results showed that the mass percentage of the carboxylic group in the structure of nanoparticles decreased with increasing exposure duration. The particle coarsening sensitivities of those hybrid nanoparticles are consistent with their EUV performance. The current work provides an understanding for the development mechanism and future guidance for the design and processing of high performance resist materials for large-scale microelectronics device fabrication.

UR - http://hdl.handle.net/10754/599792

UR - https://pubs.acs.org/doi/10.1021/acs.chemmater.5b01506

UR - http://www.scopus.com/inward/record.url?scp=84937959848&partnerID=8YFLogxK

U2 - 10.1021/acs.chemmater.5b01506

DO - 10.1021/acs.chemmater.5b01506

M3 - Article

SN - 0897-4756

VL - 27

SP - 5027

EP - 5031

JO - Chemistry of Materials

JF - Chemistry of Materials

IS - 14

ER -

Studying the Mechanism of Hybrid Nanoparticle Photoresists: Effect of Particle Size on Photopatterning

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