Studying the mechanism of hybrid nanoparticle EUV photoresists

Ben Zhang, Li Li, Jing Jiang, Mark Neisser, Jun Sung Chun, Christopher K. Ober, Emmanuel P. Giannelis

Research output: Chapter in Book/Report/Conference proceedingConference contribution


This work focuses on the investigation of dual tone patterning mechanism with hybrid inorganic/organic photoresists. Hafnium oxide (HfO2) modified with acrylic acid was prepared and the influence of electrolyte solutions as well as pH on its particle size change was investigated. The average particle size and zeta potential of the nanoparticles in different electrolyte solutions were measured. The results show that addition of different concentrations of electrolytes changed the hydrodynamic diameter of nanoparticles in water. Increased concentration of tetramethyl ammonium hydroxide (TMAH) caused the zeta potential of nanoparticles to change from positive to negative and its hydrodynamic diameter to increase from 40 nm to 165 nm. In addition, increasing concentration of triflic acid led to the decrease of particle size and zeta potential. © (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Original languageEnglish (US)
Title of host publicationAdvances in Patterning Materials and Processes XXXII
PublisherSPIE-Intl Soc Optical Eng
ISBN (Print)9781628415278
StatePublished - Mar 23 2015
Externally publishedYes

Bibliographical note

KAUST Repository Item: Exported on 2020-10-01
Acknowledgements: The authors gratefully acknowledge SEMATECH for funding, as well as the Cornell Nanoscale Science and TechnologyFacility (CNF), and the KAUST-Cornell Center of Energy and Sustainability (KAUST_CU) for use of their facilities.
This publication acknowledges KAUST support, but has no KAUST affiliated authors.


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