Structural and magnetic properties of TM-SiO2 (TM = Fe, Co, Ni) films

L. M. Socolovsky*, J. C. Denardin, A. L. Brandl, M. Knobel, Xixiang Zhang

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

9 Scopus citations


TMx-(SiO2)1-x (TM = Fe, Co, Ni) thin films were prepared in a wide concentration range (0.35 ≤x≤1). Structure was studied with transmission electron microscopy (TEM), X-ray diffraction (XRD) and small angle X-ray scattering (SAXS). Magnetic and magnetotransport properties were investigated by means of magnetization and Hall effect measurements. TEM images display nanometric spherical structures embedded in a SiO2 amorphous matrix, with typical sizes increasing from 3 to 5nm when TM volume concentration x is increased. SAXS measurements indicate a complex structure formed by nanosized objects. XRD measurements show that the structure is composed by amorphous SiO2 and TM crystallites. Slightly above the percolation threshold all samples display giant Hall effect. The observed magnetic properties are dependent on x, and display an evolution resulting from the progressive increase of the mean particle size.

Original languageEnglish (US)
Pages (from-to)102-106
Number of pages5
JournalJournal of Magnetism and Magnetic Materials
Issue number1
StatePublished - May 1 2003
EventVision Geometry VII - San Diego, CA, United States
Duration: Jul 20 1998Jul 22 1998


  • Magnetic nanoparticles
  • Magnetic thin films
  • SAXS

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics


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