Strain dependent optical helicity in monolayer WSe2

Z. Zhao; J. Lim; J. H. Kang; H. Kim; J. Huang; X. Duan; A. Javey; C. W. Wong

doi:10.1364/CLEO_SI.2018.SW3I.4

Strain dependent optical helicity in monolayer WSe₂

Z. Zhao, J. Lim^*, J. H. Kang, H. Kim, J. Huang, X. Duan, A. Javey, C. W. Wong

^*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

We investigate optical helicity of chemical vapor deposition (CVD) grown monolayer WSe₂ samples on fused silica substrates with/without a strain control. 38 (18) % of helicity for the strain controlled (uncontrolled) sample is measured at 77 K.

Original language	English (US)
Title of host publication	CLEO
Subtitle of host publication	Science and Innovations, CLEO_SI 2018
Publisher	Optica Publishing Group (formerly OSA)
ISBN (Print)	9781943580422
DOIs	https://doi.org/10.1364/CLEO_SI.2018.SW3I.4
State	Published - 2018
Event	CLEO: Science and Innovations, CLEO_SI 2018 - San Jose, United States Duration: May 13 2018 → May 18 2018

Publication series

Name	Optics InfoBase Conference Papers
Volume	Part F94-CLEO_SI 2018
ISSN (Electronic)	2162-2701

Conference

Conference	CLEO: Science and Innovations, CLEO_SI 2018
Country/Territory	United States
City	San Jose
Period	05/13/18 → 05/18/18

Bibliographical note

Publisher Copyright:
© OSA 2018.

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Mechanics of Materials

Access to Document

10.1364/CLEO_SI.2018.SW3I.4

Cite this

@inproceedings{c992a22c4f7a4a6eb16d565cce98837b,

title = "Strain dependent optical helicity in monolayer WSe2",

abstract = "We investigate optical helicity of chemical vapor deposition (CVD) grown monolayer WSe2 samples on fused silica substrates with/without a strain control. 38 (18) % of helicity for the strain controlled (uncontrolled) sample is measured at 77 K.",

author = "Z. Zhao and J. Lim and Kang, {J. H.} and H. Kim and J. Huang and X. Duan and A. Javey and Wong, {C. W.}",

note = "Publisher Copyright: {\textcopyright} OSA 2018.; CLEO: Science and Innovations, CLEO_SI 2018 ; Conference date: 13-05-2018 Through 18-05-2018",

year = "2018",

doi = "10.1364/CLEO_SI.2018.SW3I.4",

language = "English (US)",

isbn = "9781943580422",

series = "Optics InfoBase Conference Papers",

publisher = "Optica Publishing Group (formerly OSA)",

booktitle = "CLEO",

}

Zhao, Z, Lim, J, Kang, JH, Kim, H, Huang, J, Duan, X, Javey, A & Wong, CW 2018, Strain dependent optical helicity in monolayer WSe₂. in CLEO: Science and Innovations, CLEO_SI 2018. Optics InfoBase Conference Papers, vol. Part F94-CLEO_SI 2018, Optica Publishing Group (formerly OSA), CLEO: Science and Innovations, CLEO_SI 2018, San Jose, United States, 05/13/18. https://doi.org/10.1364/CLEO_SI.2018.SW3I.4

TY - GEN

T1 - Strain dependent optical helicity in monolayer WSe2

AU - Zhao, Z.

AU - Lim, J.

AU - Kang, J. H.

AU - Kim, H.

AU - Huang, J.

AU - Duan, X.

AU - Javey, A.

AU - Wong, C. W.

PY - 2018

Y1 - 2018

N2 - We investigate optical helicity of chemical vapor deposition (CVD) grown monolayer WSe2 samples on fused silica substrates with/without a strain control. 38 (18) % of helicity for the strain controlled (uncontrolled) sample is measured at 77 K.

AB - We investigate optical helicity of chemical vapor deposition (CVD) grown monolayer WSe2 samples on fused silica substrates with/without a strain control. 38 (18) % of helicity for the strain controlled (uncontrolled) sample is measured at 77 K.

UR - http://www.scopus.com/inward/record.url?scp=85048945732&partnerID=8YFLogxK

U2 - 10.1364/CLEO_SI.2018.SW3I.4

DO - 10.1364/CLEO_SI.2018.SW3I.4

M3 - Conference contribution

AN - SCOPUS:85048945732

SN - 9781943580422

T3 - Optics InfoBase Conference Papers

BT - CLEO

PB - Optica Publishing Group (formerly OSA)

T2 - CLEO: Science and Innovations, CLEO_SI 2018

Y2 - 13 May 2018 through 18 May 2018

ER -