Strain dependent optical helicity in monolayer WSe2

Z. Zhao, J. Lim*, J. H. Kang, H. Kim, J. Huang, X. Duan, A. Javey, C. W. Wong

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We investigate optical helicity of chemical vapor deposition (CVD) grown monolayer WSe2 samples on fused silica substrates with/without a strain control. 38 (18) % of helicity for the strain controlled (uncontrolled) sample is measured at 77 K.

Original languageEnglish (US)
Title of host publicationCLEO
Subtitle of host publicationScience and Innovations, CLEO_SI 2018
PublisherOptica Publishing Group (formerly OSA)
ISBN (Print)9781943580422
DOIs
StatePublished - 2018
EventCLEO: Science and Innovations, CLEO_SI 2018 - San Jose, United States
Duration: May 13 2018May 18 2018

Publication series

NameOptics InfoBase Conference Papers
VolumePart F94-CLEO_SI 2018
ISSN (Electronic)2162-2701

Conference

ConferenceCLEO: Science and Innovations, CLEO_SI 2018
Country/TerritoryUnited States
CitySan Jose
Period05/13/1805/18/18

Bibliographical note

Publisher Copyright:
© OSA 2018.

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials

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