Strain analysis in silicon substrates under uniaxial and biaxial stress by convergent beam electron diffraction

Engineering

• Applications 11%
• Biaxial Stress 11%
• Buffer Layer 11%
• Convergent Beam Electron Diffraction 44%
• Focused Ion Beam 11%
• Metal-Oxide-Semiconductor Field-Effect Transistor 22%
• Milling (Machining) 11%
• Misfit Dislocation 11%
• Si Substrate 11%
• Silicon Substrate 11%
• Small Amount 11%
• Specific Analysis 11%
• Strain 100%
• Strain Analysis 11%
• Thickness 11%

Physics

• Diffraction Pattern 11%
• Gradients 11%
• Region 11%
• Silicon 22%
• Sites 11%
• Strain Measurement 22%
• Utilization 11%
• Wafer 22%

Material Science

• Buffer Layer 11%
• Devices 11%
• Diffraction Measurement 22%
• Dislocation (Crystal) 11%
• Film 11%