Silicon Nanocrystal Nucleation as a Function of the Annealing Temperature in SiOx Films

N. Daldosso*, G. Das, G. Dalba, S. Larcheri, R. Grisenti, G. Mariotto, L. Pavesi, F. Rocca, F. Priolo, G. Franzò, A. Irrera, M. Miritello, D. Pacifici, F. Iacona

*Corresponding author for this work

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