Sequential turret source-masking system for fabrication of multilayer structures

T. Anthopoulos*, T. S. Shafai

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

4 Scopus citations


The design of sequential turret source-masking system for used in the fabrication of multilayer structures is studied. The system's component parts include: the masking system, the driving shaft connecting the four position turret source with the support plate, and the four position turret. The system in operation has produced samples with excellent dimensional accuracy operating satisfactorily up to designed temperatures.

Original languageEnglish (US)
Pages (from-to)2595-2596
Number of pages2
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Issue number5
StatePublished - Sep 2000
Externally publishedYes
Event47th International Symposium: Vacuum, Thin Films, Surfaces/Interfaces, and Processing - Boston, USA
Duration: Oct 2 2000Oct 6 2000

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces


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