Selective area epitaxy of ultra-high density InGaN quantum dots by diblock copolymer lithography

Guangyu Liu*, Hongping Zhao, Jing Zhang, Joo Hyung Park, Luke J. Mawst, Nelson Tansu

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    66 Scopus citations

    Abstract

    Highly uniform InGaN-based quantum dots (QDs) grown on a nanopatterned dielectric layer defined by self-assembled diblock copolymer were performed by metal-organic chemical vapor deposition. The cylindrical-shaped nanopatterns were created on SiNx layers deposited on a GaN template, which provided the nanopatterning for the epitaxy of ultra-high density QD with uniform size and distribution. Scanning electron microscopy and atomic force microscopy measurements were conducted to investigate the QDs morphology. The InGaN/GaN QDs with density up to 8 × 1010 cm-2 are realized, which represents ultra-high dot density for highly uniform and well-controlled, nitride-based QDs, with QD diameter of approximately 22-25 nm. The photoluminescence (PL) studies indicated the importance of NH3 annealing and GaN spacer layer growth for improving the PL intensity of the SiNx-treated GaN surface, to achieve high optical-quality QDs applicable for photonics devices.

    Original languageEnglish (US)
    Article number342
    JournalNanoscale Research Letters
    Volume6
    Issue number1
    DOIs
    StatePublished - Jan 2011

    ASJC Scopus subject areas

    • Materials Science(all)
    • Condensed Matter Physics

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