Scalable nanoimprint patterning of thin graphitic oxide sheets and in situ reduction

Yeong Yuh Lee*, Karen S.L. Chong, Seok Hong Goh, Andrew M.H. Ng, Madanagopal V. Kunnavakkam, Chiou Liu Hee, Yanping Xu, Hosea Tantang, Ching Yuan Su, Lain Jong Li

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

1 Scopus citations


This article presents a scalable technique to precisely deposit and pattern graphitic oxide (GO) flakes onto a SiO2/Si or glass substrate. A blanket coating of GO was first applied from a colloidal solution onto an amine-functionalized SiO2 /Si substrate. The amine termination was used to enhance the adhesion of GO sheets to the substrate. A poly(methyl methacrylate) (PMMA) etch mask was patterned via nanoimprint lithography on top of the GO coating. An oxygen plasma etch was then used to remove GO from areas unprotected by the PMMA mask. The PMMA mask was then dissolved by solvent lift-off technique leaving behind GO lines. GO lines down to 250 nm have been demonstrated. Reduction in hydrazine, followed by annealing in hydrogen ambient, increases the conductivity of the patterned GO lines. This technique can enable large-scale fabrication of electronic devices and sensors based on patterned GO sheets.

Original languageEnglish (US)
Pages (from-to)110231-110235
Number of pages5
JournalJournal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Issue number1
StatePublished - Jan 2011
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Process Chemistry and Technology
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering
  • Materials Chemistry


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