Resist system based on the cationic photocrosslinking of poly(4‐hydroxystyrene) and polyfunctional electrophiles

J. T. Fahey, K. Shimizu, Jean Frechet*, N. Clecak, C. G. Willson

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

16 Scopus citations

Fingerprint

Dive into the research topics of 'Resist system based on the cationic photocrosslinking of poly(4‐hydroxystyrene) and polyfunctional electrophiles'. Together they form a unique fingerprint.

Chemistry

Earth and Planetary Sciences

Material Science