Resist system based on the cationic photocrosslinking of poly(4‐hydroxystyrene) and polyfunctional electrophiles

J. T. Fahey, K. Shimizu, J. M.J. Fréchet*, N. Clecak, C. G. Willson

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

16 Scopus citations

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Engineering

Material Science

Chemical Engineering