Resist system based on the cationic photocrosslinking of poly(4-hydroxystrene) and polyfunctional electrophiles

J. T. Fahey; J. M.J. Frechet; N. Clecak; C. G. Wilson

Resist system based on the cationic photocrosslinking of poly(4-hydroxystrene) and polyfunctional electrophiles

J. T. Fahey^*, J. M.J. Frechet, N. Clecak, C. G. Wilson

^*Corresponding author for this work

Research output: Contribution to journal › Conference article › peer-review

2 Scopus citations

Abstract

Resist systems based on acid-catalyzed electrophilic aromatic substitution have been demonstrated. These systems show high sensitivity and high resolution. The design allows for aqueous base development avoiding the swelling normally associated with negative crosslinking resists. Chemical amplification is achieved due to the catalytic nature of the crosslinking reaction involved. Further improvements in resist sensitivity and resolution may be achieved through different formulations and optimization of development conditions. We are currently developing other crosslinkers that may possess enhanced characteristics for this process.

Original language	English (US)
Pages (from-to)	241-242
Number of pages	2
Journal	Polymeric Materials Science and Engineering, Proceedings of the ACS Division of Polymeric Materials Science and Engineering
Volume	64
State	Published - 1991
Externally published	Yes
Event	Proceedings of the American Chemical Society, Spring Meeting - Atlanta, GA, USA Duration: Apr 15 1991 → Apr 19 1991

ASJC Scopus subject areas

Chemical Engineering (miscellaneous)
Polymers and Plastics

Cite this

@article{da27b95b4b1947b887a46ad871e8bd8d,

title = "Resist system based on the cationic photocrosslinking of poly(4-hydroxystrene) and polyfunctional electrophiles",

abstract = "Resist systems based on acid-catalyzed electrophilic aromatic substitution have been demonstrated. These systems show high sensitivity and high resolution. The design allows for aqueous base development avoiding the swelling normally associated with negative crosslinking resists. Chemical amplification is achieved due to the catalytic nature of the crosslinking reaction involved. Further improvements in resist sensitivity and resolution may be achieved through different formulations and optimization of development conditions. We are currently developing other crosslinkers that may possess enhanced characteristics for this process.",

author = "Fahey, {J. T.} and Frechet, {J. M.J.} and N. Clecak and Wilson, {C. G.}",

year = "1991",

language = "English (US)",

volume = "64",

pages = "241--242",

journal = "Polymeric Materials Science and Engineering, Proceedings of the ACS Division of Polymeric Materials Science and Engineering",

issn = "0743-0515",

note = "Proceedings of the American Chemical Society, Spring Meeting ; Conference date: 15-04-1991 Through 19-04-1991",

}

Resist system based on the cationic photocrosslinking of poly(4-hydroxystrene) and polyfunctional electrophiles. / Fahey, J. T.; Frechet, J. M.J.; Clecak, N. et al.
In: Polymeric Materials Science and Engineering, Proceedings of the ACS Division of Polymeric Materials Science and Engineering, Vol. 64, 1991, p. 241-242.

Research output: Contribution to journal › Conference article › peer-review

TY - JOUR

T1 - Resist system based on the cationic photocrosslinking of poly(4-hydroxystrene) and polyfunctional electrophiles

AU - Fahey, J. T.

AU - Frechet, J. M.J.

AU - Clecak, N.

AU - Wilson, C. G.

PY - 1991

Y1 - 1991

N2 - Resist systems based on acid-catalyzed electrophilic aromatic substitution have been demonstrated. These systems show high sensitivity and high resolution. The design allows for aqueous base development avoiding the swelling normally associated with negative crosslinking resists. Chemical amplification is achieved due to the catalytic nature of the crosslinking reaction involved. Further improvements in resist sensitivity and resolution may be achieved through different formulations and optimization of development conditions. We are currently developing other crosslinkers that may possess enhanced characteristics for this process.

AB - Resist systems based on acid-catalyzed electrophilic aromatic substitution have been demonstrated. These systems show high sensitivity and high resolution. The design allows for aqueous base development avoiding the swelling normally associated with negative crosslinking resists. Chemical amplification is achieved due to the catalytic nature of the crosslinking reaction involved. Further improvements in resist sensitivity and resolution may be achieved through different formulations and optimization of development conditions. We are currently developing other crosslinkers that may possess enhanced characteristics for this process.

UR - http://www.scopus.com/inward/record.url?scp=0025838957&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:0025838957

SN - 0743-0515

VL - 64

SP - 241

EP - 242

JO - Polymeric Materials Science and Engineering, Proceedings of the ACS Division of Polymeric Materials Science and Engineering

JF - Polymeric Materials Science and Engineering, Proceedings of the ACS Division of Polymeric Materials Science and Engineering

T2 - Proceedings of the American Chemical Society, Spring Meeting

Y2 - 15 April 1991 through 19 April 1991

ER -

Resist system based on the cationic photocrosslinking of poly(4-hydroxystrene) and polyfunctional electrophiles

Abstract

ASJC Scopus subject areas

Other files and links

Fingerprint

Cite this