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Resist materials for 157 nm microlithography: An update
Raymond J. Hung, Hoang V. Tran, Brian C. Trinque, Takashi Chiba, Shintaro Yamada, Daniel P. Sanders, Eric F. Connor, Robert H. Grubbs, John Klopp, Jean M.J. Frechet, Brian H. Thomas, Gregory J. Shafer, Darryl D. DesMarteau, Will Conley, C. Grant Willson
Research output: Contribution to journal › Article › peer-review
72
Scopus
citations