Replication of deep x-ray lithography fabricated microstructures through casting of soft material

F. Pérennés*, B. Marmiroli, M. Tormen, M. Matteucci, E. Di Fabrizio

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

11 Scopus citations


We introduce simple double-casting replication methods for high-aspect-ratio microstructures fabricated by deep x-ray lithography using intermediate molds of soft materials. Two types of soft material are investigated. The ability to fabricate polymethylsiloxane (PDMS) molds with well-type structures with aspect ratios up to 35:1 is demonstrated for structure densities below 50%, and the reproduction from this mold of pillar-type polymethyl methacrylate (PMMA) structures with aspect ratios of 20: 1 is achieved. Polyvinyl alcohol (PVA), a water soluble polymer, is also tested as a sacrificial intermediate mold and successfully used for the replication of structures with aspect ratios up to 5:1. Double-casting replication methods are described and discussed for their potential improvement.

Original languageEnglish (US)
Article number011007
JournalJournal of Microlithography, Microfabrication and Microsystems
Issue number1
StatePublished - Jan 2006
Externally publishedYes


  • Deep x-ray lithography
  • Double casting
  • High aspect ratio
  • Polydimethylsiloxane
  • Polyvinyl alcohol

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering


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