Reducing efficiency droop for si-doped barrier model of GaN/InGaN multi-quantum well light-emitting diode by designing electron blocking layer

Pramila Mahala, Amit K. Goyal, Sumitra Singh, Suchandan Pal

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

An InGaN/GaN light-emitting diode (LED) consisting of special Si-doped barrier profile and graded-composition electron blocking layer (EBL) with varying Al composition was designed and simulated. The simulation results show that EBL can enhance the hole injection and electron confinement compared to nongraded EBL. Consequently, the LED with a special Si-doped barrier profile and graded EBL shows improved electrical and optical properties compared to LED with a special Si-doped barrier profile alone. In addition, the efficiency droop is reduced from 56.71% with nongraded EBL LEDs to 30.92% at a high injection current of 1000 A/cm2.
Original languageEnglish (US)
Title of host publicationLecture Notes in Electrical Engineering
PublisherSpringer [email protected]
Pages565-571
Number of pages7
ISBN (Print)9789811325526
DOIs
StatePublished - Jan 1 2019
Externally publishedYes

Bibliographical note

Generated from Scopus record by KAUST IRTS on 2023-10-12

Fingerprint

Dive into the research topics of 'Reducing efficiency droop for si-doped barrier model of GaN/InGaN multi-quantum well light-emitting diode by designing electron blocking layer'. Together they form a unique fingerprint.

Cite this