Reduced damage reactive ion etching process for fabrication of InGaAsP/InGaAs multiple quantum well ridge waveguide lasers

B. C. Qiu*, B. S. Ooi, A. C. Bryce, S. E. Hicks, C. D W Wilkinson, R. M. De La Rue, J. H. Marsh

*Corresponding author for this work

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Engineering & Materials Science