Reduced damage reactive ion etching process for fabrication of InGaAsP/InGaAs multiple quantum well ridge waveguide lasers

B. C. Qiu^*, B. S. Ooi, A. C. Bryce, S. E. Hicks, C. D W Wilkinson, R. M. De La Rue, J. H. Marsh

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review