Reaction of diamond thin films with atomic oxygen simulated as low-earth-orbit environment

Jingqi Li*, Qing Zhang, S. F. Yoon, J. Ahn, Qiang Zhou, Sigen Wang, Dajiang Yang, Qiang Wang, Zhonghua Li, Jingyi Wang, Qingsong Lei

*Corresponding author for this work

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    8 Scopus citations


    Diamond thin films deposited using a hot filament chemical vapor deposition (CVD) technique have been explored to atomic oxygen simulated as low-earth-orbit environment to examine their erosion-resistance properties. X-ray photoelectron spectroscopy results suggest that the atomic oxygen reacts with the diamond surface and forms ether (C-O-C) and carbonyl (>C=O) configurations. After a 3 h exposure to the atomic oxygen beam with a flux of 2.6×10 16 atoms/cm 2s, the diamond films only show a small mass loss with a reaction efficiency of 8.28×10 -26 cm 3/atom. Such a small reaction efficiency suggests that the CVD diamond is highly erosion resistive to atomic oxygen and it can be used as a passivation material in space.

    Original languageEnglish (US)
    Pages (from-to)6275-6277
    Number of pages3
    JournalJournal of Applied Physics
    Issue number10
    StatePublished - Nov 15 2002

    ASJC Scopus subject areas

    • Physics and Astronomy(all)

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