Abstract
We report on the fabrication of two-dimensional photonic crystals (2D-PC) structures by means of a focused ion beam (FIB), which is an alternative process well suited for the fast prototyping of high quality 2D-PC devices. Through FIB process the removal of materials is achieved without the use of a patterned resist mask. We have fabricated two different short in-plane cavities: the ridge geometry configuration, obtained through trenches etched down to the bottom cladding by means of a FIB process, and a second identical cavity terminated by a 2D-PC back mirror consisting of a triangular lattice of air holes in GaAs slab. Both the ridge cavity and the photonic crystal cavity have been optically characterized by detecting their edge-emitted photoluminescence. As expected, by virtue of its higher back mirror reflectivity leading to lower cavity losses, the 2D-PC cavity shows the occurrence of amplified spontaneous emission at an excitation power density three times lower than in the standard ridge cavity.
Original language | English (US) |
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Pages (from-to) | 417-421 |
Number of pages | 5 |
Journal | Microelectronic Engineering |
Volume | 78-79 |
Issue number | 1-4 |
DOIs | |
State | Published - Mar 2005 |
Externally published | Yes |
Event | Proceedings of the 30th International Conference on Micro- and Nano-Engineering - Duration: Sep 19 2004 → Sep 22 2004 |
Keywords
- Finite difference time domain
- Focused ion beam
- Laser cavity
- Photonic crystal
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering