Radiation-sensitive polymer for microelectronics: design, synthesis, and application

Jean Frechet

doi:10.1016/0923-1137(89)90055-9

Radiation-sensitive polymer for microelectronics: design, synthesis, and application

Jean Frechet^*

^*Corresponding author for this work

Physical Sciences and Engineering

Research output: Contribution to journal › Conference article › peer-review

Abstract

The author introduces the field of imaging through reactive polymers with emphasis on the macromolecular design, which is necessary to produce industrially useful radiation-sensitive polymers. Several approaches to the introduction of reactive groups into polymer pendant groups or polymer main-chain are presented, and the mechanism of subsequent radiation-induced modification is discussed. A brief introduction to applications in microlithography, holography, information storage and other microelectronics related areas is also included.

Original language	English (US)
Number of pages	1
Journal	Reactive polymers
Volume	10
Issue number	2-3
DOIs	https://doi.org/10.1016/0923-1137(89)90055-9
State	Published - Jan 1 1989
Event	Selected Papers Presented at the 4th International Conference on Polymer Supported Reactions in Organic Chemistry - Barcelona, Spain Duration: Jun 26 1988 → Jul 1 1988

ASJC Scopus subject areas

Engineering(all)

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10.1016/0923-1137(89)90055-9

Cite this

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title = "Radiation-sensitive polymer for microelectronics: design, synthesis, and application",

abstract = "The author introduces the field of imaging through reactive polymers with emphasis on the macromolecular design, which is necessary to produce industrially useful radiation-sensitive polymers. Several approaches to the introduction of reactive groups into polymer pendant groups or polymer main-chain are presented, and the mechanism of subsequent radiation-induced modification is discussed. A brief introduction to applications in microlithography, holography, information storage and other microelectronics related areas is also included.",

author = "Jean Frechet",

year = "1989",

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doi = "10.1016/0923-1137(89)90055-9",

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N2 - The author introduces the field of imaging through reactive polymers with emphasis on the macromolecular design, which is necessary to produce industrially useful radiation-sensitive polymers. Several approaches to the introduction of reactive groups into polymer pendant groups or polymer main-chain are presented, and the mechanism of subsequent radiation-induced modification is discussed. A brief introduction to applications in microlithography, holography, information storage and other microelectronics related areas is also included.

AB - The author introduces the field of imaging through reactive polymers with emphasis on the macromolecular design, which is necessary to produce industrially useful radiation-sensitive polymers. Several approaches to the introduction of reactive groups into polymer pendant groups or polymer main-chain are presented, and the mechanism of subsequent radiation-induced modification is discussed. A brief introduction to applications in microlithography, holography, information storage and other microelectronics related areas is also included.

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DO - 10.1016/0923-1137(89)90055-9

M3 - Conference article

AN - SCOPUS:0024683555

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JF - Reactive Polymers

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Y2 - 26 June 1988 through 1 July 1988

ER -

Radiation-sensitive polymer for microelectronics: design, synthesis, and application

Abstract

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