Radiation-sensitive polymer for microelectronics: design, synthesis, and application

Jean M.J. Frechet*

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review


The author introduces the field of imaging through reactive polymers with emphasis on the macromolecular design, which is necessary to produce industrially useful radiation-sensitive polymers. Several approaches to the introduction of reactive groups into polymer pendant groups or polymer main-chain are presented, and the mechanism of subsequent radiation-induced modification is discussed. A brief introduction to applications in microlithography, holography, information storage and other microelectronics related areas is also included.

Original languageEnglish (US)
Pages (from-to)307
Number of pages1
JournalReactive Polymers
Issue number2-3
StatePublished - 1989
Externally publishedYes
EventSelected Papers Presented at the 4th International Conference on Polymer Supported Reactions in Organic Chemistry - Barcelona, Spain
Duration: Jun 26 1988Jul 1 1988

ASJC Scopus subject areas

  • General Engineering


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