TY - GEN
T1 - Quantum size effect simulation on the electronic characteristic of silicon based single electron transistor
AU - Nugraha, Mohamad Insan
AU - Aji, Adha Sukma
AU - Yudhistira,
AU - Rahayu, Fitria
AU - Darma, Yudi
PY - 2011
Y1 - 2011
N2 - In this paper, we simulate quantum size effect related to the electronic properties of silicon based single electron transistor (SET). We assume that each electron interacts each other in term of Coulomb blockade effect. These electrical characteristics involve conductance and I-V characteristic of SET structure. Here, quantum size effect corresponds to the size of quantum dot (QD) in which we selected QD size in the range of 1-6 nm. The simulation results show a significant oscillation of conductance and source-drain current (I sd) when the gate voltage is varied. Obviously, by increasing the size of QD the oscillation of conductance and Isd increases as well. In contrast, the oscillations range reduced when the size of QD is increased for both, conductance and Isd characteristics. This result confirms that the bigger QD contains the higher number of electron and the less spacing energy between individual electrons in the QD. Besides conductance, the simulation results of the I-V characteristics demonstrated the staircase profile. This result indicates that one by one electron transfer occurs at certain voltages. Additionally, the staircase profile changes with increasing the number of step when the size of QD is increased as the indication of the increasing of containing electron number in the QD.
AB - In this paper, we simulate quantum size effect related to the electronic properties of silicon based single electron transistor (SET). We assume that each electron interacts each other in term of Coulomb blockade effect. These electrical characteristics involve conductance and I-V characteristic of SET structure. Here, quantum size effect corresponds to the size of quantum dot (QD) in which we selected QD size in the range of 1-6 nm. The simulation results show a significant oscillation of conductance and source-drain current (I sd) when the gate voltage is varied. Obviously, by increasing the size of QD the oscillation of conductance and Isd increases as well. In contrast, the oscillations range reduced when the size of QD is increased for both, conductance and Isd characteristics. This result confirms that the bigger QD contains the higher number of electron and the less spacing energy between individual electrons in the QD. Besides conductance, the simulation results of the I-V characteristics demonstrated the staircase profile. This result indicates that one by one electron transfer occurs at certain voltages. Additionally, the staircase profile changes with increasing the number of step when the size of QD is increased as the indication of the increasing of containing electron number in the QD.
UR - http://www.scopus.com/inward/record.url?scp=84255182594&partnerID=8YFLogxK
U2 - 10.1063/1.3667230
DO - 10.1063/1.3667230
M3 - Conference contribution
AN - SCOPUS:84255182594
SN - 9780735409927
T3 - AIP Conference Proceedings
SP - 98
EP - 101
BT - 4th Nanoscience and Nanotechnology Symposium, NNS 2011 - An International Symposium
T2 - 4th Nanoscience and Nanotechnology Symposium, NNS 2011
Y2 - 23 September 2011 through 25 September 2011
ER -