Positive Tone Nanoparticle Photoresists: New Insight on the Patterning Mechanism

Mufei Yu, Hong Xu, Vasiliki Kosma, Jeremy Odent, Kazuki Kasahara, Emmanuel Giannelis, Christopher Ober

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

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Keyphrases

Engineering

Material Science