Positive- and negative-tone water-processable photoresists: A progress report

Shintaro Yamada, David R. Medeiros, Kyle Patterson, Wei Lun K. Jen, Timo Rager, Qinghuang Lin, Carlos Lenci, Jeff D. Byers, Jennifer M. Havard, Dario Pasini, Jean M.J. Fréchet, C. Grant Willson

Research output: Contribution to journal › Conference article › peer-review