Polymers for 193-nm microlithography: Regioregular 2-alkoxycarbonylnortricyclene polymers by controlled cyclopolymerization of bulky ester derivatives of norbornadiene

Q. Jason Niu, Jean M.J. Fréchet*

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

50 Scopus citations

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Chemistry