Polymers for 193-nm microlithography: Regioregular 2-alkoxycarbonylnortricyclene polymers by controlled cyclopolymerization of bulky ester derivatives of norbornadiene

Q. Jason Niu; Jean M.J. Fréchet

doi:10.1002/(SICI)1521-3773(19980316)37:5<667::AID-ANIE667>3.0.CO;2-H

Polymers for 193-nm microlithography: Regioregular 2-alkoxycarbonylnortricyclene polymers by controlled cyclopolymerization of bulky ester derivatives of norbornadiene

Q. Jason Niu, Jean M.J. Fréchet^*

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

50 Scopus citations

Abstract

Double duty for the tert-butyl residue: The bulky substituent in monomer 1 favors free-radical cyclopolymerization with maleic anhydride to give the regioregular nortricyclene copolymer 2. When the polymer is irradiated with a photoacid generator, the tertbutyl ester is cleaved and the polymer becomes soluble in aqueous base. This type of copolymer can be used in 193-nm microlithography; images with resolutions of less than 200 nm have been obtained.

Original language	English (US)
Pages (from-to)	667-670
Number of pages	4
Journal	Angewandte Chemie - International Edition
Volume	37
Issue number	5
DOIs	https://doi.org/10.1002/(SICI)1521-3773(19980316)37:5<667::AID-ANIE667>3.0.CO;2-H
State	Published - Mar 16 1998
Externally published	Yes

Keywords

Microlithography
Photoresists
Polymerizations

ASJC Scopus subject areas

Catalysis
General Chemistry

Access to Document

10.1002/(SICI)1521-3773(19980316)37:5<667::AID-ANIE667>3.0.CO;2-H

Cite this

@article{5de8ce038b9e45bd993958982149be0a,

title = "Polymers for 193-nm microlithography: Regioregular 2-alkoxycarbonylnortricyclene polymers by controlled cyclopolymerization of bulky ester derivatives of norbornadiene",

abstract = "Double duty for the tert-butyl residue: The bulky substituent in monomer 1 favors free-radical cyclopolymerization with maleic anhydride to give the regioregular nortricyclene copolymer 2. When the polymer is irradiated with a photoacid generator, the tertbutyl ester is cleaved and the polymer becomes soluble in aqueous base. This type of copolymer can be used in 193-nm microlithography; images with resolutions of less than 200 nm have been obtained.",

keywords = "Microlithography, Photoresists, Polymerizations",

author = "Niu, {Q. Jason} and Fr{\'e}chet, {Jean M.J.}",

year = "1998",

month = mar,

day = "16",

doi = "10.1002/(SICI)1521-3773(19980316)37:5<667::AID-ANIE667>3.0.CO;2-H",

language = "English (US)",

volume = "37",

pages = "667--670",

journal = "Angewandte Chemie - International Edition",

issn = "1433-7851",

publisher = "Wiley",

number = "5",

}

TY - JOUR

T1 - Polymers for 193-nm microlithography

T2 - Regioregular 2-alkoxycarbonylnortricyclene polymers by controlled cyclopolymerization of bulky ester derivatives of norbornadiene

AU - Niu, Q. Jason

AU - Fréchet, Jean M.J.

PY - 1998/3/16

Y1 - 1998/3/16

N2 - Double duty for the tert-butyl residue: The bulky substituent in monomer 1 favors free-radical cyclopolymerization with maleic anhydride to give the regioregular nortricyclene copolymer 2. When the polymer is irradiated with a photoacid generator, the tertbutyl ester is cleaved and the polymer becomes soluble in aqueous base. This type of copolymer can be used in 193-nm microlithography; images with resolutions of less than 200 nm have been obtained.

AB - Double duty for the tert-butyl residue: The bulky substituent in monomer 1 favors free-radical cyclopolymerization with maleic anhydride to give the regioregular nortricyclene copolymer 2. When the polymer is irradiated with a photoacid generator, the tertbutyl ester is cleaved and the polymer becomes soluble in aqueous base. This type of copolymer can be used in 193-nm microlithography; images with resolutions of less than 200 nm have been obtained.

KW - Microlithography

KW - Photoresists

KW - Polymerizations

UR - http://www.scopus.com/inward/record.url?scp=0344906082&partnerID=8YFLogxK

U2 - 10.1002/(SICI)1521-3773(19980316)37:5<667::AID-ANIE667>3.0.CO;2-H

DO - 10.1002/(SICI)1521-3773(19980316)37:5<667::AID-ANIE667>3.0.CO;2-H

M3 - Article

AN - SCOPUS:0344906082

SN - 1433-7851

VL - 37

SP - 667

EP - 670

JO - Angewandte Chemie - International Edition

JF - Angewandte Chemie - International Edition

IS - 5

ER -

Polymers for 193-nm microlithography: Regioregular 2-alkoxycarbonylnortricyclene polymers by controlled cyclopolymerization of bulky ester derivatives of norbornadiene

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this