Double duty for the tert-butyl residue: The bulky substituent in monomer 1 favors free-radical cyclopolymerization with maleic anhydride to give the regioregular nortricyclene copolymer 2. When the polymer is irradiated with a photoacid generator, the tertbutyl ester is cleaved and the polymer becomes soluble in aqueous base. This type of copolymer can be used in 193-nm microlithography; images with resolutions of less than 200 nm have been obtained.
|Original language||English (US)|
|Number of pages||4|
|Journal||Angewandte Chemie - International Edition|
|State||Published - Mar 16 1998|
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