Abstract
A lattice matched multiple quantum well (MQW) structure was used to fabricate 10-channel electro-absorption (EA) modulator arrays. The method was based on using gray mask lithography and a low-energy arsenic ion-implantation induced disordering (IIID). The EA modulators were characterized through photocurrent measurements using end-fire-coupling technique. The polarization sensitivity of the devices was determined using the degree of intermixing on the group V sublattices.
Original language | English (US) |
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Pages (from-to) | 40-41 |
Number of pages | 2 |
Journal | Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS |
Volume | 1 |
State | Published - 2001 |
Externally published | Yes |
Event | 14th Annual Meeting of the IEEE Lasers and Electro-Optics Society - San Diego, CA, United States Duration: Nov 11 2001 → Nov 15 2001 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering