Abstract
Quantum well intermixing (QWI) using a neutral impurity induced disordering technique is of great interest in producing photonic integrated circuits (PICs) [ 1,2]. In this paper, we report a high selectivity QWI process using a low energy arsenic implantation induced disordering technique. Since it is known that fiee electrons fiom impurities result in high optical absorption and degrade the quality of the material after intermixing [2], arsenic, an electrically neutral species in the InGaAs/InGaAsP system, was chosen for the process development. It is noted that arsenic as a neutral impurity is not widely studied in the InGaAs-InGaAsP systems. The relatively low implantation energy, 360keV, reduces the damage generation and results in a shallow implantation depth far away fiom the active region.
Original language | English (US) |
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Title of host publication | CLEO/Pacific Rim 1999 - Pacific Rim Conference on Lasers and Electro-Optics |
Publisher | Institute of Electrical and Electronics Engineers Inc. |
Pages | 1030-1031 |
Number of pages | 2 |
ISBN (Electronic) | 0780356616, 9780780356610 |
DOIs | |
State | Published - 1999 |
Externally published | Yes |
Event | 1999 Pacific Rim Conference on Lasers and Electro-Optics, CLEO/Pacific Rim 1999 - Seoul, Korea, Republic of Duration: Aug 30 1999 → Sep 3 1999 |
Publication series
Name | CLEO/Pacific Rim 1999 - Pacific Rim Conference on Lasers and Electro-Optics |
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Volume | 3 |
Other
Other | 1999 Pacific Rim Conference on Lasers and Electro-Optics, CLEO/Pacific Rim 1999 |
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Country/Territory | Korea, Republic of |
City | Seoul |
Period | 08/30/99 → 09/3/99 |
Bibliographical note
Publisher Copyright:© 1999 IEEE.
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Computer Networks and Communications
- General Physics and Astronomy