Photogenerated Base in Resist and Imaging Materials: Design of Functional Polymers Susceptible to Base Catalyzed Decarboxylation

Jean M.J. Fréchet; Man Kit Leung; Edward J. Urankar; C. Grant Willson; James F. Cameron; Scott A. MacDonald; Claus P. Niesert

doi:10.1021/cm970220k

Photogenerated Base in Resist and Imaging Materials: Design of Functional Polymers Susceptible to Base Catalyzed Decarboxylation

Jean M.J. Fréchet^*, Man Kit Leung, Edward J. Urankar, C. Grant Willson, James F. Cameron, Scott A. MacDonald, Claus P. Niesert

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

19 Scopus citations

Abstract

A chemically amplified resist material consisting of poly[2-cyano-2-(p-vinylphenyl) butanoic acid] and bis[[(2-nitrobenzyl)oxy]carbonyl]hexane-1,6-diamine has been designed and tested in negative and positive tone imaging. The resist operates on the principle of base-catalyzed decarboxylation. Amine generated by exposure to UV radiation catalyzes the thermal loss of carbon dioxide from the polymer side chain thereby changing the solubility of the resist film in aqueous base developer. Image reversal is accomplished by in situ silylation of the exposed and thermolyzed film followed by dry development using an oxygen plasma. The resist shows high sensitivity to deep UV irradiation, ca. 10 mJ/cm², while image contrast is excellent.

Original language	English (US)
Pages (from-to)	2887-2893
Number of pages	7
Journal	Chemistry of Materials
Volume	9
Issue number	12
DOIs	https://doi.org/10.1021/cm970220k
State	Published - Dec 1997
Externally published	Yes

ASJC Scopus subject areas

General Chemistry
General Chemical Engineering
Materials Chemistry

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@article{e3a48e65dbd64efc96647435f8ff0ecb,

title = "Photogenerated Base in Resist and Imaging Materials: Design of Functional Polymers Susceptible to Base Catalyzed Decarboxylation",

abstract = "A chemically amplified resist material consisting of poly[2-cyano-2-(p-vinylphenyl) butanoic acid] and bis[[(2-nitrobenzyl)oxy]carbonyl]hexane-1,6-diamine has been designed and tested in negative and positive tone imaging. The resist operates on the principle of base-catalyzed decarboxylation. Amine generated by exposure to UV radiation catalyzes the thermal loss of carbon dioxide from the polymer side chain thereby changing the solubility of the resist film in aqueous base developer. Image reversal is accomplished by in situ silylation of the exposed and thermolyzed film followed by dry development using an oxygen plasma. The resist shows high sensitivity to deep UV irradiation, ca. 10 mJ/cm2, while image contrast is excellent.",

author = "Fr{\'e}chet, {Jean M.J.} and Leung, {Man Kit} and Urankar, {Edward J.} and Willson, {C. Grant} and Cameron, {James F.} and MacDonald, {Scott A.} and Niesert, {Claus P.}",

year = "1997",

month = dec,

doi = "10.1021/cm970220k",

language = "English (US)",

volume = "9",

pages = "2887--2893",

journal = "Chemistry of Materials",

issn = "0897-4756",

publisher = "AMER CHEMICAL SOC",

number = "12",

}

TY - JOUR

T1 - Photogenerated Base in Resist and Imaging Materials

T2 - Design of Functional Polymers Susceptible to Base Catalyzed Decarboxylation

AU - Fréchet, Jean M.J.

AU - Leung, Man Kit

AU - Urankar, Edward J.

AU - Willson, C. Grant

AU - Cameron, James F.

AU - MacDonald, Scott A.

AU - Niesert, Claus P.

PY - 1997/12

Y1 - 1997/12

N2 - A chemically amplified resist material consisting of poly[2-cyano-2-(p-vinylphenyl) butanoic acid] and bis[[(2-nitrobenzyl)oxy]carbonyl]hexane-1,6-diamine has been designed and tested in negative and positive tone imaging. The resist operates on the principle of base-catalyzed decarboxylation. Amine generated by exposure to UV radiation catalyzes the thermal loss of carbon dioxide from the polymer side chain thereby changing the solubility of the resist film in aqueous base developer. Image reversal is accomplished by in situ silylation of the exposed and thermolyzed film followed by dry development using an oxygen plasma. The resist shows high sensitivity to deep UV irradiation, ca. 10 mJ/cm2, while image contrast is excellent.

AB - A chemically amplified resist material consisting of poly[2-cyano-2-(p-vinylphenyl) butanoic acid] and bis[[(2-nitrobenzyl)oxy]carbonyl]hexane-1,6-diamine has been designed and tested in negative and positive tone imaging. The resist operates on the principle of base-catalyzed decarboxylation. Amine generated by exposure to UV radiation catalyzes the thermal loss of carbon dioxide from the polymer side chain thereby changing the solubility of the resist film in aqueous base developer. Image reversal is accomplished by in situ silylation of the exposed and thermolyzed film followed by dry development using an oxygen plasma. The resist shows high sensitivity to deep UV irradiation, ca. 10 mJ/cm2, while image contrast is excellent.

UR - http://www.scopus.com/inward/record.url?scp=0039940603&partnerID=8YFLogxK

U2 - 10.1021/cm970220k

DO - 10.1021/cm970220k

M3 - Article

AN - SCOPUS:0039940603

SN - 0897-4756

VL - 9

SP - 2887

EP - 2893

JO - Chemistry of Materials

JF - Chemistry of Materials

IS - 12

ER -

Photogenerated Base in Resist and Imaging Materials: Design of Functional Polymers Susceptible to Base Catalyzed Decarboxylation

Abstract

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