@inproceedings{412868f5eb954278831d50a6608e081e,
title = "Photogenerated base and chemical amplification: a new resist based on catalyzed decarboxylation",
abstract = "The concept of chemical amplification in microlithography was developed in the early 1980's. Recently, our research group has successfully developed a series of effective amine-photogenerators such as carbamate. These results have encouraged us to design some novel polymers that are appropriate for lithographic processes under a novel base-catalyzed approach. This paper reports the design and the synthesis of a novel polymer, poly(2-cyano-2-(p-vinylphenyl)-butanoic acid) and demonstrates for the first time the concept of a chemical amplification using photogenerated base.",
author = "Leung, {Man Kit} and Frechet, {Jean M.J.}",
year = "1993",
language = "English (US)",
isbn = "0841226644",
series = "Polymeric Materials Science and Engineering, Proceedings of the ACS Division of Polymeric Materials Science and Engineering",
publisher = "Publ by ACS",
pages = "30--31",
booktitle = "Polymeric Materials Science and Engineering, Proceedings of the ACS Division of Polymeric Materials Science and Engineering",
note = "Proceedings of the American Chemical Society Division of Polymeric Materials - Science and Engineering ; Conference date: 18-04-1993 Through 23-04-1993",
}