Perovskite Thin Films via Atomic Layer Deposition

Brandon R. Sutherland, Sjoerd Hoogland, Michael M. Adachi, Pongsakorn Kanjanaboos, Chris T. O. Wong, Jeffrey J. McDowell, Jixian Xu, Oleksandr Voznyy, Zhijun Ning, Arjan J. Houtepen, Edward H. Sargent

Research output: Contribution to journalArticlepeer-review

207 Scopus citations

Abstract

© 2014 Wiley-VCH Verlag GmbH & Co. KGaA. (Graph Presented) A new method to deposit perovskite thin films that benefit from the thickness control and conformality of atomic layer deposition (ALD) is detailed. A seed layer of ALD PbS is place-exchanged with PbI2 and subsequently CH3NH3PbI3 perovskite. These films show promising optical properties, with gain coefficients of 3200 ± 830 cm-1.
Original languageEnglish (US)
Pages (from-to)53-58
Number of pages6
JournalAdvanced Materials
Volume27
Issue number1
DOIs
StatePublished - Oct 30 2014
Externally publishedYes

Bibliographical note

KAUST Repository Item: Exported on 2020-10-01
Acknowledged KAUST grant number(s): KUS-11-009-21
Acknowledgements: This publication is based in part on work supported by an award (KUS-11-009-21) from the King Abdullah University of Science and Technology (KAUST), by the Ontario Research Fund Research Excellence Program and by the Natural Sciences and Engineering Research Council (NSERC) of Canada. The authors thank Cambridge Nanotech, Fritz Prinz, and Orlando Trejo for their advice on ALD PbS film fabrication. The authors thank L.T. Kunneman for his assistance in the data analysis of the transient absorption measurements. The authors also thank M. Yuan, H. Dong, R. Wolowiec, and D. Kopilovic for their help during the course of the study.
This publication acknowledges KAUST support, but has no KAUST affiliated authors.

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